⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14457634 | 0.84 | — | — | |
| SCHEMBL20886553 | 0.76 | — | — | |
| SCHEMBL12026567 | 0.73 | — | — | |
| SCHEMBL3455721 | 0.73 | — | — | |
| SCHEMBL12510553 | 0.73 | — | — | |
| SCHEMBL3412054 | 0.73 | — | — | |
| SCHEMBL5847031 | 0.72 | — | — | |
| SCHEMBL12747004 | 0.72 | — | — | |
| SCHEMBL23926911 | 0.71 | MEN1 (0.30) | — | |
| SCHEMBL209614 | 0.71 | MEN1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025028501-A1 | METHOD OF PRODUCING THERMOPLASTIC RESIN | 三菱瓦斯化学株式会社 | 2025-02-06 | — | — | WO | disclosed |
| US-20220135736-A1 | POLYESTER CARBONATE RESIN, AND MOLDED BODY WHICH IS OBTAINED BY MOLDING RESIN COMPOSITION CONTAINING RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-05-05 | — | — | US | disclosed |
| US-11282992-B2 | Light-emitting module provided with semiconductor light-emitting element that emits deep ultraviolet light | NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY (JP) | 2022-03-22 | — | — | US | disclosed |
| US-8993212-B2 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-20130209938-A1 | Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same | CENTRAL GLASS COMPANY, LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| EP-1270553-B1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORP (JP) | 2009-11-18 | — | — | EP | disclosed |