SCHEMBL13744346

SCHEMBL13744346

CCC1COC(CC(F)(F)F)O1

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 2/20 0.32
CHRM3 P20309 2/20 0.32
CHRM4 P08173 1/20 0.32
CHRM5 P08912 1/20 0.32
CHRM1 P11229 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9790815 0.78
SCHEMBL14034199 0.78
SCHEMBL14034174 0.78
SCHEMBL11488149 0.72
SCHEMBL18736427 0.72 PRKD3 (0.41) CHRM2CHRM3CHRM4CHRM5CHRM1
SCHEMBL13455763 0.72
SCHEMBL9790689 0.72 PRKD3 (0.41) CHRM2CHRM3CHRM4CHRM5CHRM1
SCHEMBL11084780 0.72
SCHEMBL9112206 0.72
SCHEMBL24511861 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7569323-B2 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-04 US disclosed
US-20070026341-A1 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-02-01 US disclosed