⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21201789 | 1.00 | — | — | |
| SCHEMBL13287165 | 0.98 | — | — | |
| SCHEMBL24599506 | 0.88 | — | — | |
| SCHEMBL19432814 | 0.88 | — | — | |
| SCHEMBL13760077 | 0.88 | — | — | |
| SCHEMBL12336378 | 0.88 | — | — | |
| SCHEMBL22849961 | 0.86 | — | — | |
| SCHEMBL19418036 | 0.86 | — | — | |
| SCHEMBL18885483 | 0.84 | — | — | |
| SCHEMBL19266114 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2088466-A1 | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2009-08-12 | — | — | EP | disclosed |