SCHEMBL13779571

SCHEMBL13779571

CCCCC1(OC(=O)CCCCCCCCCCCCOC(=O)C(C)(C)CC)C2CC3CC(C2)CC1C3

nearest known ligand 0.41

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 14/20 0.41
DGKA P23743 1/20 0.34
PRSS1 P07477 1/20 0.32
PRSS2 P07478 1/20 0.32
PRSS3 P35030 1/20 0.32
PRKCA P17252 2/20 0.32
NAAA Q02083 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6353822 0.96 EPHX2 (0.37) EPHX2DGKA
SCHEMBL13779572 0.92 EPHX2 (0.33) EPHX2
SCHEMBL13609227 0.86 EPHX2 (0.35) EPHX2
SCHEMBL2607746 0.85 EPHX2 (0.30) EPHX2
SCHEMBL13779573 0.84 EPHX2 (0.39) EPHX2
SCHEMBL11948928 0.83 EPHX2 (0.31) EPHX2
SCHEMBL47418 0.82 CYP17A1 (0.31) EPHX2
SCHEMBL11948903 0.82 EPHX2 (0.32) EPHX2
SCHEMBL6353166 0.81 EPHX2 (0.32) EPHX2
SCHEMBL47449 0.81 EPHX2 (0.32) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7556908-B2 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-07-07 US disclosed
US-7232642-B2 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-06-19 US disclosed