SCHEMBL13779583

SCHEMBL13779583

CCC(C)(C(=O)OCC(=O)OC1(C)CCCC1)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13779580 0.99 CYP19A1 (0.37) CYP19A1
SCHEMBL2680746 0.85 CYP19A1 (0.34) CYP19A1
SCHEMBL13779581 0.85
SCHEMBL2681720 0.84 CYP19A1 (0.36) CYP19A1
SCHEMBL685989 0.84 CYP19A1 (0.39) CYP19A1
SCHEMBL13779582 0.84
SCHEMBL686151 0.83 CYP19A1 (0.40) CYP19A1
SCHEMBL686284 0.82 CYP19A1 (0.41) CYP19A1
SCHEMBL686139 0.82 CYP19A1 (0.41) CYP19A1
SCHEMBL47550 0.82 CYP19A1 (0.38) CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7556908-B2 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-07-07 US disclosed
US-7232642-B2 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-06-19 US disclosed