SCHEMBL13779641

SCHEMBL13779641

CC1(C)COC(=O)C1Br

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9965147 0.73
SCHEMBL11582002 0.73
SCHEMBL11585439 0.73
SCHEMBL762744 0.73
SCHEMBL3408372 0.73
SCHEMBL7612224 0.71
SCHEMBL21567763 0.71
SCHEMBL1164270 0.71
SCHEMBL18964394 0.71
SCHEMBL14240875 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9850234-B2 Pyridine derivatives as soft rock inhibitors REDX PHARMA PLC (GB) 2017-12-26 US disclosed
US-20170247357-A1 PYRIDINE DERIVATIVES AS SOFT ROCK INHIBITORS REDX PHARMA PLC (GB) 2017-08-31 US disclosed
US-9682963-B2 Pyridine derivatives as soft rock inhibitors REDX PHARMA PLC (GB) 2017-06-20 US disclosed
EP-2951172-B1 PYRIDINE DERIVATIVES AS SOFT ROCK INHIBITORS AMAKEM NV (BE) 2017-03-29 EP disclosed
US-20150361072-A1 PYRIDINE DERIVATIVES AS SOFT ROCK INHIBITORS AMAKEM NV (BE) 2015-12-17 US disclosed
EP-2951172-A1 PYRIDINE DERIVATIVES AS SOFT ROCK INHIBITORS Amakem NV (BE) 2015-12-09 EP disclosed
CN-105026387-A Pyridine derivatives as soft rock inhibitors AMAKEM NV 2015-11-04 CN disclosed
WO-2014118133-A1 PYRIDINE DERIVATIVES AS SOFT ROCK INHIBITORS AMAKEM NV (BE) 2014-08-07 WO disclosed
US-7556908-B2 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-07-07 US disclosed
US-7556908-B2 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-07-07 US disclosed
US-7232642-B2 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-06-19 US disclosed
US-7232642-B2 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-06-19 US disclosed