⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9793579 | 0.84 | — | — | |
| SCHEMBL13058413 | 0.82 | — | — | |
| SCHEMBL17014239 | 0.81 | — | — | |
| SCHEMBL114934 | 0.74 | — | — | |
| SCHEMBL24687588 | 0.73 | — | — | |
| SCHEMBL10159654 | 0.73 | — | — | |
| SCHEMBL15800754 | 0.71 | — | — | |
| SCHEMBL10158257 | 0.71 | — | — | |
| SCHEMBL14517853 | 0.70 | — | — | |
| SCHEMBL9621321 | 0.70 | ADORA2A (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7541134-B2 | Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-02 | — | — | US | disclosed |
| US-20070134916-A1 | Antireflection film composition, patterning process and substrate using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-14 | — | — | US | disclosed |