SCHEMBL13827770

SCHEMBL13827770

C/C=C\C(c1ccc(O)cc1)C(C)C

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 10/20 0.48
ESR2 Q92731 8/20 0.48
PDCD1 Q15116 1/20 0.48
CD274 Q9NZQ7 1/20 0.48
CYP2C9 P11712 3/20 0.39
LMNA P02545 2/20 0.39
CYP1A2 P05177 2/20 0.39
CYP3A4 P08684 2/20 0.39
ADORA3 P0DMS8 2/20 0.39
CYP2D6 P10635 2/20 0.39
MAPT P10636 2/20 0.39
ALOX15 P16050 2/20 0.39
CYP2C19 P33261 2/20 0.39
TDP1 Q9NUW8 2/20 0.39
PGR P06401 1/20 0.39
CHRM2 P08172 1/20 0.39
AR P10275 1/20 0.39
CHRM1 P11229 1/20 0.39
DRD1 P21728 1/20 0.39
TBXA2R P21731 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14220303 1.00 ESR1 (0.48) ESR1ESR2PDCD1CD274CYP2C9
SCHEMBL3877765 0.80 ESR1 (0.41) ESR1ESR2PDCD1CD274CYP2C9
SCHEMBL3877776 0.80 ESR1 (0.41) ESR1ESR2PDCD1CD274CYP2C9
SCHEMBL13383592 0.79 ESR1 (0.44) ESR1ESR2PDCD1CD274CYP2C9
SCHEMBL9714564 0.77 ESR1 (0.50) ESR1ESR2PDCD1CD274CYP2C9
SCHEMBL13827629 0.77 ESR1 (0.50) ESR1ESR2PDCD1CD274CYP2C9
SCHEMBL12361451 0.77 ESR1 (0.50) ESR1ESR2PDCD1CD274CYP2C9
SCHEMBL3874749 0.76 ESR1 (0.45) ESR1ESR2PDCD1CD274KMT2A
SCHEMBL3793468 0.76 ESR1 (0.45) ESR1ESR2PDCD1CD274KMT2A
SCHEMBL3874756 0.76 ESR1 (0.45) ESR1ESR2PDCD1CD274KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012153869-A1 POSITIVE RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-11-15 WO disclosed