Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12519175 | 1.00 | PTGS1 (0.30) | PTGS1PTGS2 | |
| SCHEMBL12456295 | 1.00 | PTGS1 (0.30) | PTGS1PTGS2 | |
| SCHEMBL10208014 | 0.92 | — | — | |
| SCHEMBL2754952 | 0.90 | — | — | |
| SCHEMBL859094 | 0.89 | PTGS1 (0.33) | PTGS1PTGS2 | |
| SCHEMBL9947139 | 0.88 | PTGS1 (0.34) | PTGS1PTGS2 | |
| SCHEMBL14712434 | 0.87 | PTGS1 (0.31) | PTGS1PTGS2 | |
| SCHEMBL14932163 | 0.84 | PTGS1 (0.30) | PTGS1PTGS2 | |
| SCHEMBL12292927 | 0.84 | — | — | |
| SCHEMBL14754910 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160349620-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2016-12-01 | — | — | US | disclosed |
| US-20160327710-A1 | COLORING COMPOSITION, CURED FILM, COLOR FILTER, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |
| US-9482958-B2 | Method of forming pattern and developer for use in the method | FUJIFILM CORPORATION (JP) | 2016-11-01 | — | — | US | disclosed |
| US-9442373-B2 | Method of producing color filter and solid-state imaging device having colored composition containing color agent | FUJIFILM CORPORATION (JP) | 2016-09-13 | — | — | US | disclosed |
| US-20160147154-A1 | PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD FOR ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20150293454-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2015-10-15 | — | — | US | disclosed |
| US-8808965-B2 | Pattern forming method, pattern, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-8753802-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-06-17 | — | — | US | disclosed |
| US-20140145286-A1 | COLORED COMPOSITION, METHOD OF PRODUCING COLOR FILTER USING THE SAME, COLOR FILTER AND SOLID-STATE IMAGING DEVICE | FUJIFILM CORPORATION (JP) | 2014-05-29 | — | — | US | disclosed |
| US-20120288691-A1 | PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-11-15 | — | — | US | disclosed |