SCHEMBL13856017

SCHEMBL13856017

CCC(C)(CC)C(C)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.35
TDP1 Q9NUW8 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23169296 0.93 TSHR (0.35) TSHRTDP1
SCHEMBL24712816 0.85 TSHR (0.30) TSHRTDP1
SCHEMBL13130164 0.79 TSHR (0.40) TSHRTDP1
SCHEMBL13856042 0.73 TSHR (0.35) TSHRTDP1
SCHEMBL18814733 0.73 TSHR (0.35) TSHRTDP1
SCHEMBL23169804 0.73 TSHR (0.35) TSHRTDP1
SCHEMBL27352693 0.73 TSHR (0.35) TSHRTDP1
SCHEMBL23170209 0.72 TSHR (0.40) TSHRTDP1
SCHEMBL19362933 0.72 TSHR (0.40) TSHRTDP1
SCHEMBL23169277 0.72 TSHR (0.40) TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7537880-B2 Polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-05-26 US disclosed
US-20080118860-A1 Polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-05-22 US disclosed