⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4250358 | 0.87 | — | — | |
| SCHEMBL23530029 | 0.81 | — | — | |
| SCHEMBL231812 | 0.75 | — | — | |
| Ammonia Solution, Strong SCHEMBL28363581 | 0.73 | — | — | |
| SCHEMBL16668930 | 0.71 | — | — | |
| SCHEMBL3799875 | 0.71 | — | — | |
| SCHEMBL703265 | 0.71 | — | — | |
| SCHEMBL17049699 | 0.71 | — | — | |
| SCHEMBL7758814 | 0.71 | — | — | |
| SCHEMBL1260949 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7534904-B2 | Silicon-containing compound, composition containing said compound, and insulating material | FUJIFILM CORPORATION (JP) | 2009-05-19 | — | — | US | disclosed |
| US-20070054136-A1 | Film forming composition, insulating film and production process of the insulating film | FUJI PHOTO FILM CO., LTD. | 2007-03-08 | — | — | US | disclosed |
| US-20070034992-A1 | Insulating film-forming composition, insulating film and production method thereof | FUJI PHOTO FILM CO., LTD. | 2007-02-15 | — | — | US | disclosed |