SCHEMBL13879059

SCHEMBL13879059

CC(C)(C)CCC(=O)OC1CC2CC1C1C3CC(CC3C(=O)OCOC3CC4CCC3C4)C21

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15278118 0.89 CYP19A1 (0.32) CYP19A1
SCHEMBL18029746 0.87
SCHEMBL47486 0.84 GRM1 (0.32)
SCHEMBL15278117 0.83 ATM (0.30)
SCHEMBL14982824 0.82 ATM (0.30)
SCHEMBL14136042 0.82
SCHEMBL14984073 0.81 GRM1 (0.32)
SCHEMBL824260 0.81 GRM1 (0.31)
SCHEMBL13753715 0.79 EPHX2 (0.37) CYP19A1
SCHEMBL13753714 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1882981-B1 POSITIVE-WORKING RESIST COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION TOKYO OHKA KOGYO CO LTD (JP) 2012-12-19 EP disclosed
EP-2045661-A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2009-04-08 EP disclosed