Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12961198 | 1.00 | CYP2D6 (0.31) | CYP2D6 | |
| SCHEMBL14818249 | 1.00 | CYP2D6 (0.31) | CYP2D6 | |
| SCHEMBL3205261 | 0.85 | CYP2D6 (0.30) | CYP2D6 | |
| SCHEMBL4637500 | 0.85 | CYP2D6 (0.30) | CYP2D6 | |
| SCHEMBL5073716 | 0.85 | CYP2D6 (0.30) | CYP2D6 | |
| SCHEMBL14401969 | 0.85 | CYP2D6 (0.30) | CYP2D6 | |
| SCHEMBL4636087 | 0.85 | CYP2D6 (0.30) | CYP2D6 | |
| SCHEMBL4606966 | 0.85 | CYP2D6 (0.30) | CYP2D6 | |
| SCHEMBL13077456 | 0.85 | CYP2D6 (0.30) | CYP2D6 | |
| SCHEMBL14510216 | 0.85 | CYP2D6 (0.30) | CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8507172-B2 | Positive resist composition and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-7524609-B2 | Photo sensitive composition, pattern-forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2009-04-28 | — | — | US | disclosed |
| US-20080227025-A1 | Localized on resist film; peak area of a high molecular weight; flowability of immersion liquid in patterning by exposure; prevention of coating and development defects; resin has perfluoroalkyl, fluorinated alcohol, alkylsilyl structure, cyclic siloxane, sulfonimido and/or bis(carbonyl)methylene groups | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |
| US-7294450-B2 | Chemical amplification-type resist composition and production process thereof | FUJIFILM CORPORATION (JP) | 2007-11-13 | — | — | US | disclosed |
| US-20070212645-A1 | Photo sensitive composition, pattern-forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-09-13 | — | — | US | disclosed |
| US-20070172761-A1 | Positive photosensitive composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2007-07-26 | — | — | US | disclosed |
| US-20070026343-A1 | Chemical amplification-type resist composition and production process thereof | FUJI PHOTO FILM CO., LTD. | 2007-02-01 | — | — | US | disclosed |