SCHEMBL13921983

SCHEMBL13921983

CCC(C)(C)C(=O)NCCNc1ccccc1C(=O)OC

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 6/20 0.59
GLA P06280 1/20 0.59
GAA P10253 2/20 0.50
KMT2A Q03164 2/20 0.48
POLB P06746 1/20 0.48
ATM Q13315 1/20 0.48
ALDH1A1 P00352 7/20 0.47
RIPK1 Q13546 3/20 0.47
HTT P42858 1/20 0.45
MEN1 O00255 1/20 0.45
NPC1 O15118 1/20 0.45
MAPT P10636 1/20 0.44
ALOX15 P16050 1/20 0.44
CYP1A2 P05177 1/20 0.43
CYP2C19 P33261 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
ADRA1D P25100 1/20 0.43
ADRA1A P35348 1/20 0.43
ADRA1B P35368 1/20 0.43
HSD17B10 Q99714 3/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6510593 0.80 KDM4E (0.61) KDM4EGLAGAAKMT2APOLB
SCHEMBL7819029 0.78 KDM4E (0.76) KDM4EGLAGAAKMT2APOLB
SCHEMBL28672732 0.76 KDM4E (0.71) KDM4EGLAGAAKMT2APOLB
SCHEMBL6513253 0.75 KDM4E (1.00) KDM4EGLAGAAKMT2APOLB
SCHEMBL1903514 0.75 KDM4E (0.70) KDM4EGLAGAAKMT2APOLB
SCHEMBL5928710 0.75 KDM4E (0.69) KDM4EGLAGAAKMT2APOLB
SCHEMBL10364552 0.74 KDM4E (0.73) KDM4EGLAGAAKMT2APOLB
Hydrochloric Acid SCHEMBL27603991 0.74 KDM4E (0.68) KDM4EGLAGAAKMT2APOLB
SCHEMBL5272294 0.73 KDM4E (0.68) KDM4EGLAGAAKMT2APOLB
SCHEMBL29047146 0.73 KDM4E (0.68) KDM4EGLAGAAKMT2APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7507525-B2 Polymerizable composition and lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2009-03-24 US disclosed
US-7279539-B2 Alkali-soluble polymer and polymerizable composition thereof FUJIFILM CORPORATION (JP) 2007-10-09 US disclosed