SCHEMBL139735

SCHEMBL139735

C=CC(=O)OCCOCCOCCO

nearest known ligand 0.83

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 9/20 0.83
ALDH1A1 P00352 5/20 0.83
TP53 P04637 3/20 0.83
HIF1A Q16665 3/20 0.83
HSD17B10 Q99714 1/20 0.83
CYP3A4 P08684 2/20 0.56
THRB P10828 4/20 0.55
HPGD P15428 1/20 0.50
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
MAPK1 P28482 2/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
HTT P42858 1/20 0.34
MAPT P10636 1/20 0.34
EPHX2 P34913 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1537403 1.00 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL1537388 1.00 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL259313 1.00 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL1537467 1.00 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL10533428 1.00 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL8852469 1.00 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL1537378 1.00 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL130139 1.00 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL10530471 1.00 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL224782 1.00 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2380 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4634297-A1 COLOR CHANGEABLE (METH) ACRYLATE COMPOSITIONS AND METHODS OF USING THE SAME Henkel AG & Co. KGaA (DE) 2025-10-22 EP claimed
US-20250297072-A1 COLOR CHANGEABLE (METH)ACRYLATE COMPOSITIONS AND METHODS OF USING THE SAME HENKEL AG & CO KGAA (DE) 2025-09-25 US claimed
WO-2025084741-A1 POLYOLEFIN GRAFT COPOLYMER PRODUCED USING INITIATOR CONTAINING AZIDOFORMATE GROUP AND PRODUCTION METHOD THEREFOR 세종대학교산학협력단 2025-04-24 WO claimed
CN-119391335-B Adhesive gel with anisotropy and preparation method and application thereof 中国科学院理化技术研究所 2025-04-01 CN claimed
CN-119391335-A Adhesive gel with anisotropy and preparation method and application thereof 中国科学院理化技术研究所 2025-02-07 CN claimed
WO-2025024325-A2 ALL-ACRYLIC TRIBLOCK AND TETRABLOCK COPOLYMERS HAVING A LACTAM MOIETY AND APPLICATIONS THEREOF ISP INVESTMENTS LLC (US) 2025-01-30 WO claimed
EP-4453566-A2 CRITICALLY-LOCKED MECHANICAL METAMATERIAL FOR HYPER-RESPONSIVE MOLECULAR PROFILING National University of Singapore (SG) 2024-10-30 EP claimed
CN-118715438-A Critical locking mechanical metamaterials for super-responsive molecular analysis 新加坡国立大学 2024-09-27 CN claimed
US-20240317919-A1 BLOCK COPOLYMERS DERIVED FROM SHORT AND LONG ALKYL CHAIN ACRYLATES OR ACRYLAMIDES AND APPLICATIONS THEREOF ISP INVESTMENTS LLC 2024-09-26 US claimed
WO-2024124541-A1 COLOR CHANGEABLE (METH) ACRYLATE COMPOSITIONS AND METHODS OF USING THE SAME HENKEL AG & CO. KGAA (DE) 2024-06-20 WO claimed
EP-0287233-A2 Polymeric vehicle for coatings NORTH DAKOTA STATE UNIVERSITY (US) 1988-10-19 EP claimed
WO-1988007558-A1 POLYMERIC VEHICLE FOR COATINGS NORTH DAKOTA STATE UNIVERSITY (US) 1988-10-06 WO claimed
EP-0222059-A2 Improved radiation-hardenable diluents HENKEL CORPORATION (a Delaware corp.) (US) 1987-05-20 EP claimed
US-4396706-A ADDITION INTERPOLYMER PARTICLES, MATTES FUJI PHOTO FILM CO., LTD. (JP) 1983-08-02 US claimed
US-4368300-A BONDING, IMPACT STRENGTH UBE INDUSTRIES, LTD. (JP) 1983-01-11 US claimed
US-4267202-A Method for modifying the surface properties of polymer substrates KANSAI PAINT CO., LTD. (JP) 1981-05-12 US claimed
US-4256782-A IRRADIATING A POLYMERIZABLE COMPOUND ON THE SURFACE KANSAI PAINT CO., LTD. (JP) 1981-03-17 US claimed
US-4247621-A Original pattern plate obtained by use of photo-sensitive resin composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1981-01-27 US claimed
US-4170582-A Process for preparing a polymer resin aqueous dispersion DAINIPPON INK AND CHEMICALS, INC. (JP) 1979-10-09 US claimed
US-4140605-A PHOTOPOLYMERIZATION, MELAMINE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1979-02-20 US claimed