SCHEMBL14010789

SCHEMBL14010789

CCC(C)(C)C(=O)OC1C2(C)SC3(C)CC(C)(S2)SC1(C)S3

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL130773 0.71 — —
SCHEMBL18253433 0.70 HMGCR (0.32) —
SCHEMBL13246443 0.70 — —
SCHEMBL18253429 0.69 — —
SCHEMBL16976260 0.69 — —
SCHEMBL18487759 0.69 — —
SCHEMBL18022244 0.69 — —
SCHEMBL3434648 0.69 EPHX1 (0.37) —
SCHEMBL17068805 0.68 — —
SCHEMBL18803431 0.68 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080292989-A1 POSITIVE WORKING PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-11-27 — — US disclosed
Send feedback