SCHEMBL14029062

SCHEMBL14029062

OC1CN=C(CCC2=NCC(O)CN2)NC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14029056 0.91
SCHEMBL9592874 0.78
SCHEMBL3540279 0.70
SCHEMBL6136719 0.70
SCHEMBL3540281 0.70
SCHEMBL8344060 0.70
SCHEMBL29531090 0.70
Hydrochloric Acid SCHEMBL9326277 0.68 PDCD1 (0.31)
Hydrochloric Acid SCHEMBL4167584 0.68 PDCD1 (0.31)
Hydrochloric Acid SCHEMBL8680082 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7439011-B2 Photothermographic material FUJIFILM CORPORATION (JP) 2008-10-21 US disclosed
US-7419774-B2 Photothermographic material and method for processing the same FUJILFILM CORPORATION (JP) 2008-09-02 US disclosed