⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15375244 | 0.96 | — | — | |
| Ammonia Solution, Strong SCHEMBL15375362 | 0.96 | — | — | |
| SCHEMBL111870 | 0.86 | — | — | |
| SCHEMBL14350654 | 0.83 | — | — | |
| Ammonia Solution, Strong SCHEMBL15375272 | 0.83 | — | — | |
| SCHEMBL15375536 | 0.83 | — | — | |
| SCHEMBL20439589 | 0.78 | — | — | |
| SCHEMBL12378315 | 0.77 | — | — | |
| SCHEMBL20462494 | 0.77 | — | — | |
| SCHEMBL12422312 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 386 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4350792-A1 | ELECTRONIC DEVICE | Panasonic Holdings Corporation (JP) | 2024-04-10 | — | — | EP | claimed |
| EP-4350793-A1 | COMPOSITION AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING SAME | Panasonic Holdings Corporation (JP) | 2024-04-10 | — | — | EP | claimed |
| US-20240057356-A1 | ELECTRONIC DEVICE | PANASONIC HOLDINGS CORPORATION (JP) | 2024-02-15 | — | — | US | claimed |
| US-20240057367-A1 | COMPOSITION AND METHODS FOR MANUFACTURING ELECTRONIC DEVICE WITH THE COMPOSITION | PANASONIC HOLDINGS CORPORATION (JP) | 2024-02-15 | — | — | US | claimed |
| EP-4350792-A1 | ELECTRONIC DEVICE | Panasonic Holdings Corporation (JP) | 2024-04-10 | — | — | EP | disclosed |
| EP-4350793-A1 | COMPOSITION AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING SAME | Panasonic Holdings Corporation (JP) | 2024-04-10 | — | — | EP | disclosed |
| US-20240057356-A1 | ELECTRONIC DEVICE | PANASONIC HOLDINGS CORPORATION (JP) | 2024-02-15 | — | — | US | disclosed |
| US-20240057367-A1 | COMPOSITION AND METHODS FOR MANUFACTURING ELECTRONIC DEVICE WITH THE COMPOSITION | PANASONIC HOLDINGS CORPORATION (JP) | 2024-02-15 | — | — | US | disclosed |
| US-11796912-B2 | Radiation-sensitive composition and pattern-forming method | JSR CORPORATION (JP) | 2023-10-24 | — | — | US | disclosed |
| US-20230266666-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-24 | — | — | US | disclosed |
| US-20230231199-A1 | SECONDARY BATTERY AND VEHICLE INCLUDING SECONDARY BATTERY | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2023-07-20 | — | — | US | disclosed |
| US-20230231199-A1 | SECONDARY BATTERY AND VEHICLE INCLUDING SECONDARY BATTERY | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2023-07-20 | — | — | US | disclosed |
| US-20070203345-A1 | Ambient-temperature molten salts and process for producing the same | TOYOTA JIDOSHA KABUSHIKI KAISHA | 2007-08-30 | — | — | US | disclosed |
| US-20070160815-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | FUJIFILM CORPORATION (JP) | 2007-07-12 | — | — | US | disclosed |
| US-20070160815-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | FUJIFILM CORPORATION (JP) | 2007-07-12 | — | — | US | disclosed |
| US-20070087288-A1 | Positive-working photosensitive composition and pattern forming method using the same | FUJIFILM CORPORATION | 2007-04-19 | — | — | US | disclosed |
| US-20070065752-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-22 | — | — | US | disclosed |
| US-20070065752-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-22 | — | — | US | disclosed |
| US-4697011-A | N-fluoro-N-perfluoromethyl sulfonamides | RESEARCH CORPORATION (US) | 1987-09-29 | — | — | US | disclosed |
| EP-0211578-A2 | N-fluoro-N-perfluoromethyl sulfonamides | Research Corporation (US) | 1987-02-25 | — | — | EP | disclosed |