⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3408 | 0.67 | — | — | |
| SCHEMBL29016 | 0.63 | — | — | |
| SCHEMBL8385976 | 0.63 | — | — | |
| Tert-Butylamine SCHEMBL8722462 | 0.63 | — | — | |
| Water SCHEMBL15166701 | 0.63 | — | — | |
| Hydrochloric Acid SCHEMBL6062599 | 0.63 | — | — | |
| SCHEMBL61522 | 0.63 | — | — | |
| Hydrochloric Acid SCHEMBL637674 | 0.63 | — | — | |
| SCHEMBL23701337 | 0.60 | — | — | |
| Bromide SCHEMBL6859174 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8343706-B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-01-01 | — | — | US | disclosed |
| US-20110183259-A1 | FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-07-28 | — | — | US | disclosed |
| US-20080199416-A1 | Free radically polymerized, crosslinked copolymer of vinylpyrrolidone-methacrylic acid-vinylimidazole-C16-C18-polyethylene glycol methacrylate- ethylene glycol dimethacrylate; quaternized with methyl chloride or methyl sulfate; neutralized with triethanolamine; hair spray, shampoo, cosmetics | BASF AKTIENGESELLSCHAFT (DE) | 2008-08-21 | — | — | US | disclosed |