SCHEMBL142047

SCHEMBL142047

CCCC[C]=C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL167623 0.88 TSHR (0.44)
SCHEMBL10318507 0.88 TSHR (0.44)
SCHEMBL15602923 0.88 TSHR (0.44)
SCHEMBL5972588 0.88 TSHR (0.44)
SCHEMBL16673160 0.88 TSHR (0.44)
SCHEMBL141646 0.88 TSHR (0.44)
SCHEMBL16673339 0.88 TSHR (0.44)
SCHEMBL10320431 0.88 TSHR (0.44)
SCHEMBL10318763 0.88 TSHR (0.44)
SCHEMBL10320432 0.88 TSHR (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3223952-B1 ENERGY INPUT DURING AGGLOMERATION FOR MAGNETIC SEPARATION BASF SE (DE) 2024-01-17 EP disclosed
EP-4301520-A1 MAGNETIC SEPARATION OF PARTICLES SUPPORTED BY SPECIFIC SURFACTANTS BASF SE (DE) 2024-01-10 EP disclosed
WO-2023229395-A1 CURABLE COMPOSITION 주식회사 엘지화학 2023-11-30 WO disclosed
CN-116438009-A Particle magnetic separation assisted by specific surfactants 巴斯夫欧洲公司 2023-07-14 CN disclosed
WO-2023101220-A1 CURABLE COMPOSITION, PROTECTIVE FILM, OPTICAL ELEMENT, AND LIQUID CRYSTAL DISPLAY DEVICE 주식회사 엘지화학 2023-06-08 WO disclosed
WO-2023054961-A1 CURABLE COMPOSITION 주식회사 엘지화학 2023-04-06 WO disclosed
WO-2022184817-A1 MAGNETIC SEPARATION OF PARTICLES SUPPORTED BY SPECIFIC SURFACTANTS BASF SE (DE) 2022-09-09 WO disclosed
WO-2022071667-A1 CURABLE COMPOSITION 주식회사 엘지화학 2022-04-07 WO disclosed
CN-108367300-B Ultrafiltration of magnetically responsive support particles 巴斯夫欧洲公司 2022-01-14 CN disclosed
US-11110468-B2 Separation of a mixture using magnetic carrier particles BASF SE (DE) 2021-09-07 US disclosed
EP-2354166-B1 METHOD FOR PRODUCING POLYMER NANOCOMPOSITE, AND FLAME-RETARDANT POLYMER NANOCOMPOSITE FORMED BY THE PRODUCTION METHOD UNIV KYUSHU NAT UNIV CORP (JP) 2013-04-03 EP disclosed
US-20120264111-A1 HYDROPHOBIC, FUNCTIONALIZED PARTICLES BASF CORPORATION (US) 2012-10-18 US disclosed
WO-2012140065-A1 HYDROPHOBIC, FUNCTIONALISED PARTICLES BASF SE (DE) 2012-10-18 WO disclosed
US-20120058463-A1 HYDROPHOBIC, FUNCTIONALIZED PARTICLES SIEMENS AG (DE) 2012-03-08 US disclosed
US-20110213111-A1 METHOD FOR PRODUCING POLYMER NANOCOMPOSITE, AND FLAME-RETARDANT POLYMER NANOCOMPOSITE FORMED BY THE PRODUCTION METHOD KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CO. (JP) 2011-09-01 US disclosed
EP-2354166-A1 METHOD FOR PRODUCING POLYMER NANOCOMPOSITE, AND FLAME-RETARDANT POLYMER NANOCOMPOSITE FORMED BY THE PRODUCTION METHOD Kyushu University, National University Corporation (JP) 2011-08-10 EP disclosed
US-20050130251-A1 Reagent for determination of hydrogen peroxide KYOWA MEDEX CO., LTD. (JP) 2005-06-16 US disclosed
EP-1424554-A1 REAGENT FOR DETERMINING HYDROGEN PEROXIDE KYOWA MEDEX CO., LTD. (JP) 2004-06-02 EP disclosed
US-4396735-A N-HETEROCYCLIC COMPOUND AND A HETEROCYCLIC ACID HYDRAZIDE ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1983-08-02 US disclosed
US-4362831-A A HINDERED AND HETEROCYCLIC AMINE WITH A THIOALKANOIC ACID AMIDE ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1982-12-07 US disclosed