2-Heptanol

2-Heptanol

SCHEMBL142134

CCCCCC(C)O.CCCCOCCCC

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.50
HTT P42858 2/20 0.45
MEN1 O00255 1/20 0.45
THRB P10828 1/20 0.45
KMT2A Q03164 1/20 0.45
MAPT P10636 1/20 0.45
USP2 O75604 1/20 0.44
SPHK1 Q9NYA1 2/20 0.43
CYP3A4 P08684 1/20 0.43
HSD17B10 Q99714 1/20 0.43
OPRM1 P35372 1/20 0.41
LPAR5 Q9H1C0 1/20 0.41
GPR84 Q9NQS5 3/20 0.39
FFAR1 O14842 1/20 0.39
CA1 P00915 1/20 0.39
LMNA P02545 1/20 0.38
PRKD3 O94806 1/20 0.38
PRKCG P05129 1/20 0.38
PRKCB P05771 1/20 0.38
PRKCA P17252 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15508257 0.95 TSHR (0.50) TSHRHTTMEN1THRBKMT2A
SCHEMBL16510215 0.93 HTT (0.48) TSHRHTTMEN1THRBKMT2A
SCHEMBL12491099 0.93 HTT (0.54) TSHRHTTMEN1THRBKMT2A
SCHEMBL4669394 0.93 HTT (0.54) TSHRHTTMEN1THRBKMT2A
SCHEMBL7742001 0.93 HTT (0.48) TSHRHTTMEN1THRBKMT2A
SCHEMBL8433899 0.93 HTT (0.54) TSHRHTTMEN1THRBKMT2A
SCHEMBL11302347 0.93 HTT (0.54) TSHRHTTMEN1THRBKMT2A
SCHEMBL8373515 0.93 HTT (0.54) TSHRHTTMEN1THRBKMT2A
SCHEMBL8979934 0.93 HTT (0.54) TSHRHTTMEN1THRBKMT2A
SCHEMBL8941354 0.93 HTT (0.54) TSHRHTTMEN1THRBKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8895231-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-25 US disclosed
US-8741554-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-03 US disclosed
US-20120058428-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-08 US disclosed
US-20100304297-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-12-02 US disclosed