SCHEMBL14217368

SCHEMBL14217368

CCCCCCCCCCCCC(CCCCCCCCCC)Cc1cc(-c2ccc(-c3cc(CC(CCCCCCCCCC)CCCCCCCCCCCC)c(-c4cc5ccc6c(ccc7cc(C)sc76)c5s4)s3)c3nsnc23)sc1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15785193 0.95 — —
SCHEMBL19240268 0.87 — —
SCHEMBL19472377 0.84 — —
SCHEMBL19472358 0.84 — —
SCHEMBL19472360 0.83 — —
SCHEMBL19472354 0.83 — —
SCHEMBL19718295 0.82 — —
SCHEMBL18195183 0.80 — —
SCHEMBL15785195 0.80 — —
SCHEMBL25488780 0.78 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8921836-B2 Polymer compound, and thin film and ink composition each containing same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-12-30 — — US disclosed
US-20120305899-A1 POLYMER COMPOUND, AND THIN FILM AND INK COMPOSITION EACH CONTAINING SAME NATIONAL UNIVERSITY OF CORPORATION HIROSHIMA UNIVERSITY (JP) 2012-12-06 — — US disclosed
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