⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1426589 | 0.62 | — | — | |
| SCHEMBL1425851 | 0.60 | — | — | |
| SCHEMBL15145226 | 0.60 | — | — | |
| SCHEMBL766963 | 0.59 | — | — | |
| SCHEMBL18828483 | 0.57 | — | — | |
| Formaldehyde SCHEMBL25217928 | 0.56 | — | — | |
| SCHEMBL4818912 | 0.52 | — | — | |
| SCHEMBL22541677 | 0.46 | — | — | |
| SCHEMBL10867704 | 0.45 | — | — | |
| SCHEMBL23394524 | 0.45 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10640462-B2 | Oil gelator | NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) | 2020-05-05 | — | — | US | disclosed |
| WO-2020085508-A1 | FILM-FORMING COMPOSITION | 日産化学株式会社 | 2020-04-30 | — | — | WO | disclosed |
| EP-3524656-A1 | NOVEL HYDROGELATOR | National University Corporation Shizuoka University (JP) | 2019-08-14 | — | — | EP | disclosed |
| US-20190241598-A1 | NOVEL HYDROGELATOR | NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) | 2019-08-08 | — | — | US | disclosed |
| US-10289002-B2 | Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-05-14 | — | — | US | disclosed |
| US-20180362454-A1 | OIL GELATOR | NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) | 2018-12-20 | — | — | US | disclosed |
| EP-3381995-A1 | OIL-GELLING AGENT | National University Corporation Shizuoka University (JP) | 2018-10-03 | — | — | EP | disclosed |
| US-10042247-B2 | Mask blank, method for manufacturing mask blank and transfer mask | HOYA CORPORATION (JP) | 2018-08-07 | — | — | US | disclosed |
| US-20170285460-A1 | MASK BLANK, METHOD FOR MANUFACTURING MASK BLANK AND TRANSFER MASK | HOYA CORPORATION (JP) | 2017-10-05 | — | — | US | disclosed |
| US-9645494-B2 | Resist underlayer film forming composition containing low molecular weight dissolution accelerator | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-05-09 | — | — | US | disclosed |
| US-8481247-B2 | Resist underlayer film forming composition containing liquid additive | NISSAN CHEMICAL INDUSTRIES, LTD. | 2013-07-09 | — | — | US | disclosed |
| US-20110086310-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCTION OF MICROLENS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-04-14 | — | — | US | disclosed |
| EP-2302456-A1 | POSITIVE-TYPE RESIST COMPOSITION, AND METHOD FOR PRODUCTION OF MICROLENS | Nissan Chemical Industries, Ltd. (JP) | 2011-03-30 | — | — | EP | disclosed |
| US-20100291483-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING BRANCHED POLYHYDROXYSTYRENE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-18 | — | — | US | disclosed |
| US-20100096663-A1 | PHOTOSENSITIVE RESIN AND PROCESS FOR PRODUCING MICROLENS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-04-22 | — | — | US | disclosed |
| US-20100075253-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LOW MOLECULAR WEIGHT DISSOLUTION ACCELERATOR | NISSAN CHEMICAL INDUSTRIES , LTD. (JP) | 2010-03-25 | — | — | US | disclosed |
| EP-2154569-A1 | PHOTOSENSITIVE RESIN AND PROCESS FOR PRODUCING MICROLENS | Nissan Chemical Industries, Ltd. (JP) | 2010-02-17 | — | — | EP | disclosed |
| US-20090311624-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-17 | — | — | US | disclosed |
| US-6153648-A | Iodopropargylamine compounds, and industrial antimicrobial and antifungal agents, algicides, and antifouling agents containing the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2000-11-28 | — | — | US | disclosed |
| EP-1016649-A1 | IODOPROPAGYLAMINE COMPOUNDS, AND INDUSTRIAL ANTIMICROBIAL AND ANTIFUNGAL AGENTS, ALGICIDES, AND ANTIFOULING AGENTS CONTAINING THE SAME | Nissan Chemical Industries, Ltd. (JP) | 2000-07-05 | — | — | EP | disclosed |