Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | ESR1 | P03372 | 4/20 | 0.39 |
| ▸ | ESR2 | Q92731 | 4/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | GSK3B | P49841 | 1/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 2/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.30 |
| ▸ | ACHE | P22303 | 1/20 | 0.30 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10785234 | 0.78 | CYP3A4 (0.45) | CYP3A4TDP1ESR1ESR2TP53 | |
| SCHEMBL13391635 | 0.78 | CYP3A4 (0.45) | CYP3A4TDP1ESR1ESR2TP53 | |
| SCHEMBL9441831 | 0.78 | CYP3A4 (0.45) | CYP3A4TDP1ESR1ESR2TP53 | |
| SCHEMBL2782005 | 0.76 | CYP3A4 (0.43) | CYP3A4TDP1ESR1ESR2TP53 | |
| SCHEMBL15841160 | 0.75 | ESR1 (0.31) | CYP3A4TDP1ESR1ESR2 | |
| Bromide SCHEMBL493074 | 0.74 | CYP3A4 (0.41) | CYP3A4TDP1ESR1ESR2TP53 | |
| SCHEMBL9492996 | 0.74 | CYP3A4 (0.41) | CYP3A4TDP1ESR1ESR2TP53 | |
| SCHEMBL10024968 | 0.74 | CYP3A4 (0.41) | CYP3A4TDP1ESR1ESR2TP53 | |
| Hydrochloric Acid SCHEMBL493348 | 0.74 | TDP1 (0.41) | CYP3A4TDP1ESR1ESR2TP53 | |
| Bromide SCHEMBL8602057 | 0.74 | CYP3A4 (0.41) | CYP3A4TDP1ESR1ESR2TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9316910-B2 | Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film | FUJIFILM CORPORATION (JP) | 2016-04-19 | — | — | US | disclosed |
| US-9017917-B2 | Resist composition and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2015-04-28 | — | — | US | disclosed |
| US-20120322007-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-12-20 | — | — | US | disclosed |