SCHEMBL1437982

SCHEMBL1437982

CCC(C)(C)C=CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27974674 0.79 TSHR (0.43)
SCHEMBL14715454 0.77
SCHEMBL14715453 0.77
SCHEMBL3049765 0.73
SCHEMBL18996697 0.71
SCHEMBL27495010 0.71
SCHEMBL8534853 0.71
SCHEMBL11748803 0.71
SCHEMBL27934604 0.71
SCHEMBL4632229 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3137569-B1 ANAEROBIC CURABLE COMPOSITIONS CONTAINING BLOCKED (METH)ACRYLIC ACID COMPOUNDS Henkel IP & Holding GmbH (DE) 2020-04-15 EP claimed
WO-2022236548-A1 STAR POLYMER, COATING MATERIAL, COATING FILM, AND METHOD FOR PRODUCING STAR POLYMER DIC CORPORATION (JP) 2022-11-17 WO disclosed
EP-3694913-A1 DIELECTRIC FILM AND POWER CAPACITOR COMPRISING DIELECTRIC FILM ABB Power Grids Switzerland AG (CH) 2020-08-19 EP disclosed
CN-106483760-B Photosensitive composite, its manufacturing method, the forming method of film, viscosity increase suppressing method, Photoepolymerizationinitiater initiater and its manufacturing method 东京应化工业株式会社 2019-11-12 CN disclosed
CN-110317174-A Hydrogen barrier, hydrogen barrier film, which are formed, uses composition, hydrogen barrier film, the manufacturing method of hydrogen barrier film and electronic component 东京应化工业株式会社 2019-10-11 CN disclosed
WO-2019071396-A1 DIELECTRIC FILM AND POWER CAPACITOR COMPRISING DIELECTRIC FILM ABB SCHWEIZ AG (CH) 2019-04-18 WO disclosed
CN-106483764-A Photosensitive composite, pattern formation method, solidfied material and display device 东京应化工业株式会社 2017-03-08 CN disclosed
WO-2011025070-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-03-03 WO disclosed
US-7686880-B2 Process for producing pigment complex and pigment-containing composition CANON KABUSHIKI KAISHA (JP) 2010-03-30 US disclosed
US-20080003288-A1 Responsive microgel and methods related thereto SUPRATEK PHARMA INC. (CA) 2008-01-03 US disclosed
US-7204997-B2 Responsive microgel and methods related thereto SUPRATEK PHARMA INC. (CA) 2007-04-17 US disclosed
US-20060060109-A1 dissolving a pigment in a supercritical state or subcritical state fluid and contacting the fluid containing the dissolved pigment with a block or graft copolymer-containing solution; extremely high pigment dispersion stability and have a small and uniform particle size; excellent color purity CANON KABUSHIKI KAISHA (JP) 2006-03-23 US disclosed
US-20030152623-A1 Responsive microgel and methods related thereto SUPRATEK PHARMA INC. (CA) 2003-08-14 US disclosed
EP-0910351-A1 PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS G.D. Searle & Co. (US) 1999-04-28 EP disclosed
EP-0907666-A1 PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS G.D. Searle & Co. (US) 1999-04-14 EP disclosed
WO-1997049736-A2 PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS G.D. SEARLE AND CO. (US) 1997-12-31 WO disclosed
WO-1997049387-A1 PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS G.D. SEARLE AND CO. (US) 1997-12-31 WO disclosed
EP-0203798-A2 Nitrogen-containing heterocyclic compounds, and their production and use SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1986-12-03 EP disclosed