SCHEMBL14410074

SCHEMBL14410074

CCCC(CC)C(=O)OC1(C2CCCC2)CCCC1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CYP3A4 P08684 4/20 0.35
CHRM1 P11229 3/20 0.35
CHRM3 P20309 3/20 0.35
TSHR P16473 3/20 0.35
CHRM2 P08172 2/20 0.35
KCNH2 Q12809 2/20 0.35
HTR2A P28223 2/20 0.35
HTR2C P28335 2/20 0.35
HRH1 P35367 2/20 0.35
DRD3 P35462 2/20 0.35
ABCB11 O95342 1/20 0.35
LMNA P02545 1/20 0.35
CYP1A2 P05177 1/20 0.35
CHRM4 P08173 1/20 0.35
CHRM5 P08912 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
DRD1 P21728 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17675599 0.84 CYP3A4 (0.35) CYP3A4CHRM1CHRM3TSHRCHRM2
SCHEMBL17675500 0.83 CYP3A4 (0.36) CYP3A4CHRM1CHRM3TSHRCHRM2
SCHEMBL17675457 0.83 CYP3A4 (0.36) CYP3A4CHRM1CHRM3TSHRCHRM2
SCHEMBL6367040 0.80 CYP3A4 (0.38) CYP3A4CHRM1CHRM3TSHRCHRM2
SCHEMBL6367188 0.79 CYP3A4 (0.40) CYP3A4CHRM1CHRM3TSHRCHRM2
SCHEMBL2618681 0.79 CYP3A4 (0.40) CYP3A4CHRM1CHRM3TSHRCHRM2
SCHEMBL19261060 0.79 CYP3A4 (0.37) CYP3A4CHRM1CHRM3TSHRCHRM2
SCHEMBL6367205 0.79 CYP3A4 (0.40) CYP3A4CHRM1CHRM3TSHRCHRM2
SCHEMBL19261065 0.78 CYP3A4 (0.39) CYP3A4CHRM1CHRM3TSHRCHRM2
SCHEMBL19261057 0.78 CYP3A4 (0.39) CYP3A4CHRM1CHRM3TSHRCHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1829850-A2 Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2007-09-05 EP disclosed