Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 3/20 | 0.77 |
| ▸ | ADRA2A | P08913 | 3/20 | 0.77 |
| ▸ | SLC6A2 | P23975 | 3/20 | 0.77 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.77 |
| ▸ | TACR2 | P21452 | 2/20 | 0.77 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.77 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.77 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.77 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.77 |
| ▸ | LMNA | P02545 | 1/20 | 0.77 |
| ▸ | SHBG | P04278 | 1/20 | 0.77 |
| ▸ | TP53 | P04637 | 1/20 | 0.77 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.77 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.77 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.77 |
| ▸ | HTR2C | P28335 | 1/20 | 0.77 |
| ▸ | HSPE1 | P61604 | 1/20 | 0.77 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.77 |
| ▸ | TST | Q16762 | 1/20 | 0.77 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.77 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9345284 | 1.00 | ESR1 (0.77) | ESR1ADRA2ASLC6A2ADORA3TACR2 | |
| SCHEMBL7784766 | 1.00 | ESR1 (0.77) | ESR1ADRA2ASLC6A2ADORA3TACR2 | |
| SCHEMBL9165397 | 1.00 | ESR1 (0.77) | ESR1ADRA2ASLC6A2ADORA3TACR2 | |
| SCHEMBL5684044 | 1.00 | ESR1 (0.77) | ESR1ADRA2ASLC6A2ADORA3TACR2 | |
| SCHEMBL8398450 | 1.00 | ESR1 (0.77) | ESR1ADRA2ASLC6A2ADORA3TACR2 | |
| SCHEMBL4631265 | 1.00 | ESR1 (0.77) | ESR1ADRA2ASLC6A2ADORA3TACR2 | |
| SCHEMBL9166790 | 1.00 | ESR1 (0.77) | ESR1ADRA2ASLC6A2ADORA3TACR2 | |
| SCHEMBL253453 | 1.00 | ESR1 (0.77) | ESR1ADRA2ASLC6A2ADORA3TACR2 | |
| SCHEMBL2777921 | 1.00 | ESR1 (0.77) | ESR1ADRA2ASLC6A2ADORA3TACR2 | |
| SCHEMBL449737 | 0.97 | ESR1 (0.77) | ESR1ADRA2ASLC6A2ADORA3TACR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 253 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3235850-B1 | POLYCARBONATE COPOLYMER AND PREPARATION METHOD THEREFOR | SAMYANG CORP (KR) | 2020-02-12 | — | — | EP | claimed |
| US-10081708-B2 | Polycarbonate copolymer and preparation method therefor | SAMYANG CORPORATION (KR) | 2018-09-25 | — | — | US | claimed |
| US-20180162994-A1 | Polycarbonate Copolymer And Preparation Method Therefor | SAMYANG CORPORATION (KR) | 2018-06-14 | — | — | US | claimed |
| EP-3235850-A1 | POLYCARBONATE COPOLYMER AND PREPARATION METHOD THEREFOR | Samyang Corporation (KR) | 2017-10-25 | — | — | EP | claimed |
| CN-106029773-A | Novel antiagglomerating agents for the production of polyisobutenes | 巴斯夫东南亚有限公司 | 2016-10-12 | — | — | CN | claimed |
| US-5283314-A | Polymerizing an oligomer of a dihydric phenol and a branching agent with a dihydric alcohol and a monohydric phenol with stirring | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 1994-02-01 | — | — | US | claimed |
| US-5041523-A | Interfacial polycondensation using divalent phenol and branching agent | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 1991-08-20 | — | — | US | claimed |
| US-4439511-A | Light-sensitive mixture based on O-naphthoquinone diazide ester of condensate of bisphenol and formaldehyde and light-sensitive copying material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-03-27 | — | — | US | claimed |
| EP-3489303-B1 | POLYCARBONATE RESIN COMPOSITION | MITSUBISHI ENG PLASTICS CORP (JP) | 2026-05-27 | — | — | EP | disclosed |
| EP-4692236-A1 | THERMOPLASTIC RESIN COMPOSITION HAVING EXCELLENT HARDNESS, DISCOLORATION RESISTANCE, AND IMPACT RESISTANCE, AND MOLDED ARTICLE COMPRISING SAME | Samyang Corporation (KR) | 2026-02-11 | — | — | EP | disclosed |
| EP-4685179-A1 | POLYCARBONATE RESIN COMPOSITION HAVING EXCELLENT IONIZING RADIATION RESISTANCE, AND MOLDED ARTICLE INCLUDING SAME | Samyang Corporation (KR) | 2026-01-28 | — | — | EP | disclosed |
| US-12378364-B2 | Polysiloxane-polycarbonate copolymer using hydroxy-terminated polysiloxane mixture, and method for producing same | SAMYANG CORPORATION (KR) | 2025-08-05 | — | — | US | disclosed |
| EP-4141046-B1 | POLYSILOXANE-POLYCARBONATE COPOLYMER USING HYDROXY-TERMINATED POLYSILOXANE MIXTURE, AND METHOD FOR PRODUCING SAME | SAMYANG CORP (KR) | 2025-07-16 | — | — | EP | disclosed |
| US-20250197632-A1 | POLYCARBONATE RESIN COMPOSITION HAVING EXCELLENT MECHANICAL PROPERTIES AND IMPROVED OPTICAL PROPERTIES, AND MOLDED PRODUCT COMPRISING SAME | SAMYANG CORPORATION (KR) | 2025-06-19 | — | — | US | disclosed |
| EP-0189073-A2 | Thermotropic aromatic polyesters with high heat stability, process for their fabrication and their use for the fabrication of moulded articles, of filaments, of fibres and films | BAYER AG (DE) | 1986-07-30 | — | — | EP | disclosed |
| EP-0069966-B1 | PHOTOSENSIBLE MIXTURE ON THE BASIS OF O-NAPHTHOQUINONE DIAZIDES, AND PHOTOSENSIBLE COPYING MATERIAL PRODUCED THEREFROM | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-09-18 | — | — | EP | disclosed |
| US-4517275-A | Light-sensitive mixture based on O-naphthoquinone-diazides, and light-sensitive copying material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-05-14 | — | — | US | disclosed |
| US-4439511-A | Light-sensitive mixture based on O-naphthoquinone diazide ester of condensate of bisphenol and formaldehyde and light-sensitive copying material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-03-27 | — | — | US | disclosed |
| EP-0069966-A1 | Photosensible mixture on the basis of o-naphthoquinone diazides, and photosensible copying material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-01-19 | — | — | EP | disclosed |
| EP-0068346-A1 | Photosensitive mixture on the basis of o-naphthoquinone diazides, and photosensitive copying material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-01-05 | — | — | EP | disclosed |