SCHEMBL1456401

SCHEMBL1456401

C=CC12CCCCC1O2.C=CC1CCC2OC2C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28464285 0.85
SCHEMBL24052015 0.79
SCHEMBL7939234 0.79
SCHEMBL134014 0.79
SCHEMBL7067068 0.78
SCHEMBL7067192 0.78
SCHEMBL1783720 0.78
SCHEMBL7067074 0.78
SCHEMBL12611624 0.78
SCHEMBL7067198 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115003759-B Resin composition, method for producing same, and multicomponent curable resin composition 株式会社钟化 2023-12-01 CN disclosed
CN-115003759-A Resin composition, method for producing same, and multi-component curable resin composition 株式会社钟化 2022-09-02 CN disclosed
US-10227505-B2 Active energy ray-curable composition KANEKA CORPORATION (JP) 2019-03-12 US disclosed
CN-104210046-B LAMINATE FOR FORMING FINE PATTERN 旭化成株式会社 2017-05-10 CN disclosed
EP-2348081-B1 ADHESIVE COMPOSITION AND OPTICAL MEMBER CHEIL IND INC (KR) 2017-03-01 EP disclosed
CN-104210047-B Fine pattern formation laminate and the manufacture method of fine pattern formation laminate 旭化成株式会社 2016-09-28 CN disclosed
US-20160145467-A1 ACTIVE ENERGY RAY-CURABLE COMPOSITION KANEKA CORPORATION (JP) 2016-05-26 US disclosed
CN-102197101-B Adhesive composition and optical element CHEIL INDUSTRIES INC. (KR) 2015-10-21 CN disclosed
US-20140307398-A1 IMAGE DISPLAY DEVICE SUMITOMO BAKELITE COMPANY LIMITED (JP) 2014-10-16 US disclosed
US-20140273686-A1 TRANSPARENT COMPOSITE SUBSTRATE AND DISPLAY ELEMENT SUBSTRATE SUMITOMO BAKELITE COMPANY LIMITED (JP) 2014-09-18 US disclosed
US-7910278-B2 Toner for developing electrostatic image ZEON CORPORATION (JP) 2011-03-22 US disclosed
US-20100222525-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2010-09-02 US disclosed
US-7723445-B2 Curable resin composition, molded product, and process for producing the same SHOWA HIGHPOLYMER CO., LTD. (JP) 2010-05-25 US disclosed
EP-2067824-A1 CURABLE RESIN COMPOSITION, OPTICAL MATERIAL, AND METHOD OF REGULATING OPTICAL MATERIAL Nippon Shokubai Co., Ltd. (JP) 2009-06-10 EP disclosed
US-20090008834-A1 Curable resin composition, molded product, and process for producing the same SHOWA HIGHPOLYMER CO., LTD. (JP) 2009-01-08 US disclosed
EP-1967540-A1 CURABLE COMPOSITION Kaneka Corporation (JP) 2008-09-10 EP disclosed
US-20080085985-A1 CURABLE RESIN COMPOSITION, OPTICAL MATERIAL, AND METHOD FOR CONTROLLING OPTICAL MATERIAL NIPPON SHOKUBAI CO., LTD. (JP) 2008-04-10 US disclosed
US-20070269733-A1 Toner for Developing Electrostatic Image ZEON CORPORATION (JP) 2007-11-22 US disclosed
EP-1832934-A1 TONER FOR ELECTROSTATIC-IMAGE DEVELOPMENT ZEON CORPORATION (JP) 2007-09-12 EP disclosed
EP-1785440-A1 CURABLE RESIN COMPOSITION, SHAPED ARTICLE AND METHOD FOR PRODUCING SAME Showa Highpolymer Co., Ltd. (JP) 2007-05-16 EP disclosed