⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12760943 | 0.83 | — | — | |
| SCHEMBL14590948 | 0.83 | — | — | |
| SCHEMBL12753183 | 0.75 | — | — | |
| SCHEMBL14589538 | 0.72 | — | — | |
| SCHEMBL12760963 | 0.68 | — | — | |
| SCHEMBL12753117 | 0.66 | — | — | |
| SCHEMBL14252156 | 0.66 | — | — | |
| SCHEMBL13127589 | 0.65 | — | — | |
| SCHEMBL14589515 | 0.65 | — | — | |
| SCHEMBL12760965 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7169531-B2 | Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives | INFINEON TECHNOLOGIES, AG (DE) | 2007-01-30 | — | — | US | disclosed |