⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14601991 | 0.81 | — | — | |
| SCHEMBL14602006 | 0.81 | — | — | |
| SCHEMBL14601970 | 0.80 | — | — | |
| SCHEMBL14602056 | 0.76 | — | — | |
| SCHEMBL14602016 | 0.72 | — | — | |
| SCHEMBL14602096 | 0.71 | KDM4E (0.34) | — | |
| SCHEMBL14602107 | 0.70 | — | — | |
| SCHEMBL14602057 | 0.70 | — | — | |
| SCHEMBL12764623 | 0.68 | — | — | |
| SCHEMBL75072 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112898313-A | Methacrylate monomer and preparation method thereof | 宁波南大光电材料有限公司 | 2021-06-04 | — | — | CN | disclosed |
| US-7169541-B2 | Compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |
| US-7169541-B2 | Compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |