Ethylene Glycol

Ethylene Glycol

SCHEMBL1461647

C=C.C=C.C=C.CCCCOCCCC.OCCO

nearest known ligand 0.75

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.75
MEN1 O00255 3/20 0.58
KMT2A Q03164 3/20 0.58
THRB P10828 1/20 0.58
HTT P42858 1/20 0.58
MAPT P10636 1/20 0.58
ALDH1A1 P00352 4/20 0.45
CYP3A4 P08684 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.43
LMNA P02545 2/20 0.41
HSD17B10 Q99714 1/20 0.41
USP2 O75604 1/20 0.40
MAPK1 P28482 1/20 0.40
ADRB2 P07550 1/20 0.39
ADRB1 P08588 1/20 0.39
ADRB3 P13945 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene Glycol SCHEMBL986168 1.00 TSHR (0.75) TSHRMEN1KMT2ATHRBHTT
Ethylene Glycol SCHEMBL8636269 1.00 TSHR (0.75) TSHRMEN1KMT2ATHRBHTT
Ethylene Glycol SCHEMBL1147464 1.00 TSHR (0.75) TSHRMEN1KMT2ATHRBHTT
Ethylene Glycol SCHEMBL220582 1.00 TSHR (0.75) TSHRMEN1KMT2ATHRBHTT
Ethylene Glycol SCHEMBL988077 1.00 TSHR (0.75) TSHRMEN1KMT2ATHRBHTT
Ethylene Glycol SCHEMBL23499010 1.00 TSHR (0.75) TSHRMEN1KMT2ATHRBHTT
Ethylene Glycol SCHEMBL11564762 0.95 TSHR (0.68) TSHRMEN1KMT2ATHRBHTT
Ethylene Glycol SCHEMBL23356849 0.95 TSHR (0.68) TSHRMEN1KMT2ATHRBHTT
Ethylene Glycol SCHEMBL23356752 0.95 TSHR (0.68) TSHRMEN1KMT2ATHRBHTT
Ethylene Glycol SCHEMBL18784039 0.94 TSHR (0.83) TSHRMEN1KMT2ATHRBHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119387948-A Cleaning-free low-residue soldering paste and preparation method thereof 深圳市绿色千田锡业科技有限公司 2025-02-07 CN claimed
US-20230001348-A1 NON-AQUEOUS SOLVENT FOR REMOVING ACIDIC GAS FROM A PROCESS GAS STREAM FOR HIGH PRESSURE APPLICATIONS RESEARCH TRIANGLE INSTITUTE 2023-01-05 US claimed
US-20220355422-A1 LEAD-FREE SOLDER MATERIAL, LAYER STRUCTURE, METHOD OF FORMING A SOLDER MATERIAL, AND METHOD OF FORMING A LAYER STRUCTURE INFINEON TECHNOLOGIES AG (DE) 2022-11-10 US claimed
CN-115229381-A Lead-free solder material, layer structure, method of forming solder material and layer structure 英飞凌科技股份有限公司 2022-10-25 CN claimed
EP-4072703-A1 NON-AQUEOUS SOLVENT FOR REMOVING ACIDIC GAS FROM A PROCESS GAS STREAM FOR HIGH PRESSURE APPLICATIONS Research Triangle Institute (US) 2022-10-19 EP claimed
WO-2021119058-A1 NON-AQUEOUS SOLVENT FOR REMOVING ACIDIC GAS FROM A PROCESS GAS STREAM FOR HIGH PRESSURE APPLICATIONS RESEARCH TRIANGLE INSTITUTE (US) 2021-06-17 WO claimed
EP-2038086-B1 NO-CLEAN LOW-RESIDUE SOLDER PASTE FOR SEMICONDUCTOR DEVICE APPLICATIONS HERAEUS DEUTSCHLAND GMBH & CO KG (DE) 2015-02-25 EP claimed
US-7767032-B2 alloy powder dispersed in a flux mixture comprising a low amount of rosin in combination with a viscous solvent system, thixotropic agents, activators, additives and optionally plasticizers; for die-attach dispensing or fine pitch printing; homogeneity; without prior cleaning W.C. Heraeus Holding GmbH (DE) 2010-08-03 US claimed
EP-2038086-A1 NO-CLEAN LOW-RESIDUE SOLDER PASTE FOR SEMICONDUCTOR DEVICE APPLICATIONS Umicore AG & Co. KG (DE) 2009-03-25 EP claimed
US-20080000549-A1 No-clean low-residue solder paste for semiconductor device applications UMICORE AG & CO. KG (DE) 2008-01-03 US claimed
WO-2008000349-A1 NO-CLEAN LOW-RESIDUE SOLDER PASTE FOR SEMICONDUCTOR DEVICE APPLICATIONS UMICORE AG & CO. KG (DE) 2008-01-03 WO claimed
US-4075830-A Solid adhesive compositions KONISHI CO., LTD. (JA) 1978-02-28 US claimed
US-4073756-A WAX-LIKE OR JELLY-LIKE AT ROOM TEMPERATURE KONISHI CO., LTD. (JA) 1978-02-14 US claimed
WO-2025137551-A1 AMINE PURIFICATION IN A CARBON CAPTURE METHOD USING MOF BODIES SCHLUMBERGER TECHNOLOGY CORPORATION (US) 2025-06-26 WO disclosed
CN-119387948-A Cleaning-free low-residue soldering paste and preparation method thereof 深圳市绿色千田锡业科技有限公司 2025-02-07 CN disclosed
EP-4359111-A1 MBZA/PEG ETHYL ETHER BASED LIQUID SOLVENT CO2 CAPTURE IN ROTATING PACKED BED Research Triangle Institute (US) 2024-05-01 EP disclosed
US-5892125-A REACTING 1,3-BUTADIENE WITH AN AMINE; ISOMERIZATION BASF AKTIENGESELLSCHAFT (DE) 1999-04-06 US disclosed
US-5705707-A REACTING 1,3-BUTADIENE WITH ALCOHOL; ISOMERIZATION USING TRANSITION METAL CATALYST; HYDROGENATION, HYDROLYSIS BASF AKTIENGESELLSCHAFT (DE) 1998-01-06 US disclosed
US-4075830-A Solid adhesive compositions KONISHI CO., LTD. (JA) 1978-02-28 US disclosed
US-4073756-A WAX-LIKE OR JELLY-LIKE AT ROOM TEMPERATURE KONISHI CO., LTD. (JA) 1978-02-14 US disclosed