Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.32 |
| ▸ | SCN1A | P35498 | 1/20 | 0.32 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.32 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12986568 | 0.81 | CYP19A1 (0.42) | CYP19A1NPSR1FFAR3SCN1ASCN2A | |
| SCHEMBL4872716 | 0.79 | CYP19A1 (0.44) | CYP19A1NPSR1FFAR3SCN1ASCN2A | |
| SCHEMBL14982574 | 0.79 | CYP19A1 (0.41) | CYP19A1NPSR1FFAR3SCN1ASCN2A | |
| SCHEMBL6079757 | 0.79 | CYP19A1 (0.44) | CYP19A1NPSR1FFAR3SCN1ASCN2A | |
| SCHEMBL12986569 | 0.79 | CYP19A1 (0.41) | CYP19A1NPSR1FFAR3SCN1ASCN2A | |
| SCHEMBL25383029 | 0.79 | CYP19A1 (0.44) | CYP19A1NPSR1FFAR3SCN1ASCN2A | |
| SCHEMBL135404 | 0.79 | CYP19A1 (0.41) | CYP19A1NPSR1FFAR3SCN1ASCN2A | |
| SCHEMBL10702855 | 0.77 | CYP19A1 (0.40) | CYP19A1NPSR1FFAR3SCN1ASCN2A | |
| SCHEMBL183131 | 0.77 | CYP19A1 (0.43) | CYP19A1NPSR1FFAR3SCN1ASCN2A | |
| SCHEMBL12332047 | 0.77 | CYP19A1 (0.40) | CYP19A1NPSR1FFAR3SCN1ASCN2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11543749-B2 | Resist composition and method for producing resist pattern, and method for producing plated molded article | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-03 | — | — | US | disclosed |
| CN-106610566-B | Chemically amplified positive resist composition and patterning method | 信越化学工业株式会社 | 2021-10-08 | — | — | CN | disclosed |
| US-20210278765-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-09-09 | — | — | US | disclosed |
| CN-113296357-A | Resist composition, method for producing resist pattern, and method for producing plated molded article | 住友化学株式会社 | 2021-08-24 | — | — | CN | disclosed |
| CN-106444288-B | Chemically amplified positive resist composition and pattern forming method | 信越化学工业株式会社 | 2021-04-09 | — | — | CN | disclosed |
| EP-3163374-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-12-02 | — | — | EP | disclosed |
| US-10815572-B2 | Chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-27 | — | — | US | disclosed |
| EP-3128368-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2018-01-24 | — | — | EP | disclosed |
| EP-3163374-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-05-03 | — | — | EP | disclosed |
| US-20170115567-A1 | Chemically Amplified Positive Resist Composition and Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-20170038684-A1 | Chemically Amplified Positive Resist Composition and Pattern Forming Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-02-09 | — | — | US | disclosed |
| EP-3128368-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-02-08 | — | — | EP | disclosed |
| US-8980525-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-17 | — | — | US | disclosed |
| US-20130026044-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-31 | — | — | US | disclosed |
| EP-2551722-A1 | Chemically amplified positive resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-01-30 | — | — | EP | disclosed |