SCHEMBL146786

SCHEMBL146786

O=[Pm]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27969996 0.87
SCHEMBL23023855 0.87
SCHEMBL28125050 0.87
Oxygen SCHEMBL27339327 0.67
Methane SCHEMBL13723447 0.58
Charcoal, Activated SCHEMBL1535100 0.58
Methane SCHEMBL12971541 0.58
Methane SCHEMBL21404648 0.58
Methane SCHEMBL16028182 0.58
Methane SCHEMBL23327714 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2006 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116487553-B Double-coating high-nickel lithium ion positive electrode material and preparation method and application thereof 贵州振华新材料有限公司 2026-05-19 CN claimed
EP-3766103-B1 SOLID-STATE ENERGY HARVESTER OF TRANSITION METAL SUBOXIDES OMEGA ENERGY SYSTEMS LLC (US) 2025-12-24 EP claimed
WO-2025229055-A1 OXYGEN SENSOR ETH ZURICH (CH) 2025-11-06 WO claimed
US-12338179-B2 Refractory material with taggant to enable identification of material during reclaiming process HarbisonWalker International Holdings, Inc. (US) 2025-06-24 US claimed
US-12305275-B2 Corrosion resistant film on a chamber component and methods of depositing thereof APPLIED MATERIALS, INC. (US) 2025-05-20 US claimed
US-20250126917-A1 IMAGE SENSOR SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-04-17 US claimed
WO-2025078594-A1 SELECTION METHOD FOR SELECTING NETWORK SLICES SUITABLE FOR A SERVICE, MANAGEMENT METHOD FOR MANAGING AT LEAST ONE NETWORK SLICE AND COMUNICATION METHOD, AND ENTITIES CONFIGURED TO IMPLEMENT THESE METHODS ORANGE (FR) 2025-04-17 WO claimed
CN-119836025-A Image sensor 三星电子株式会社 2025-04-15 CN claimed
CN-119683650-A Method for synthesizing ammonia by electrothermal catalysis 甬江实验室 2025-03-25 CN claimed
CN-119463584-A Photosensitive invisible anti-counterfeiting ceramic ink and preparation method and application thereof 佛山欧神诺陶瓷有限公司 2025-02-18 CN claimed
WO-2003072678-A1 ABRASIVE PARTICLES CONTAINING SINTERED, POLYCRYSTALLINE ZIRCONIA 3M INNOVATIVE PROPERTIES COMPANY (US) 2003-09-04 WO claimed
US-20030136331-A1 Crystal growth method of oxide, cerium oxide, promethium oxide, multi-layered structure of oxides, manufacturing method of field effect transistor, manufacturing method of ferroelectric non-volatile memory and ferroelectric non-volatile memory SISTINA SOFTWARE, INC., A DELAWARE CORPORATION 2003-07-24 US claimed
CN-1327245-A Aluminium electrolytic capacitor and its producing mehtod MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 2001-12-19 CN claimed
US-6074971-A BARIUM STRONTIUM TITANATE WITH MAGNESIUM OXIDE AND RARE EARTH OXIDE COMPOSITES THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY (US) 2000-06-13 US claimed
WO-1991016705-A1 METHOD FOR MAKING MAGNETIC OXIDE PRECIPITATES MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 1991-10-31 WO claimed
US-5030332-A CONTAINING IRON OXIDE; FORMING A MIXTURE WITH MATRIX MATERIAL, MELTING OR VAPORIZATION AND RAPID COOLING MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 1991-07-09 US claimed
EP-0022530-B1 A PATTERNED LAYER ARTICLE AND MANUFACTURING METHOD THEREFOR KABUSHIKI KAISHA TOSHIBA (JP) 1983-01-26 EP claimed
US-4350729-A Patterned layer article and manufacturing method therefor TOKYO SHIBAURA DENKI KABUSHIKI KAISHA (JP) 1982-09-21 US claimed
US-4285055-A Self-luminescent light source for liquid crystal display watch HITACHI, LTD. (JP) 1981-08-18 US claimed
EP-0022530-A1 A patterned layer article and manufacturing method therefor KABUSHIKI KAISHA TOSHIBA (JP) 1981-01-21 EP claimed