⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14686425 | 1.00 | — | — | |
| SCHEMBL14686429 | 1.00 | — | — | |
| SCHEMBL14686457 | 1.00 | — | — | |
| SCHEMBL14686481 | 1.00 | — | — | |
| SCHEMBL14686731 | 1.00 | — | — | |
| SCHEMBL14686434 | 1.00 | — | — | |
| SCHEMBL14686553 | 0.97 | TSHR (0.30) | — | |
| SCHEMBL14686468 | 0.97 | TSHR (0.30) | — | |
| SCHEMBL14686440 | 0.97 | TSHR (0.30) | — | |
| SCHEMBL8625045 | 0.97 | TSHR (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8802352-B2 | Salt, photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-08-12 | — | — | US | disclosed |
| US-8741544-B2 | Salt, photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-06-03 | — | — | US | disclosed |
| US-20130052588-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130040239-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-14 | — | — | US | disclosed |