⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3727236 | 0.82 | — | — | |
| SCHEMBL547723 | 0.73 | — | — | |
| SCHEMBL8635168 | 0.71 | — | — | |
| SCHEMBL9509208 | 0.70 | — | — | |
| SCHEMBL93366 | 0.67 | — | — | |
| SCHEMBL221342 | 0.66 | — | — | |
| SCHEMBL545086 | 0.66 | — | — | |
| SCHEMBL11803953 | 0.59 | — | — | |
| SCHEMBL11758022 | 0.59 | — | — | |
| SCHEMBL5274356 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108165095-B | Ink for quickly positioning back reference position of substrate and positioning method thereof | 深圳市容大感光科技股份有限公司 | 2020-12-18 | — | — | CN | disclosed |
| US-8486601-B2 | Toner for electrostatic latent image development and image forming method | KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) | 2013-07-16 | — | — | US | disclosed |
| US-20110223534-A1 | HYDROPHOBILIZATION METHOD FOR PARTICLES | KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) | 2011-09-15 | — | — | US | disclosed |
| US-20110070535-A1 | TONER FOR ELECTROSTATIC LATENT IMAGE DEVELOPMENT AND IMAGE FORMING METHOD | KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) | 2011-03-24 | — | — | US | disclosed |
| EP-1359172-B1 | ULTRAVIOLET-CURABLE RESIN COMPOSITION AND PHOTOSOLDER RESIST INK CONTAINING THE COMPOSITION | GOO CHEMICAL CO LTD (JP) | 2009-05-27 | — | — | EP | disclosed |
| EP-1324135-B1 | ULTRAVIOLET-CURABLE RESIN COMPOSITION AND PHOTOSOLDER RESIST INK CONTAINING THE COMPOSITION | GOO CHEMICAL CO LTD (JP) | 2009-04-01 | — | — | EP | disclosed |
| US-6964813-B2 | Ultraviolet curable resin composition and photo solder resist including the same | GOO CHEMICAL CO., LTD. (JP) | 2005-11-15 | — | — | US | disclosed |
| US-6896967-B2 | Ultraviolet-curable resin composition and photosolder resist ink containing the composition | GOO CHEMICAL CO., LTD. (JP) | 2005-05-24 | — | — | US | disclosed |
| US-20040044102-A1 | Ultraviolet-curable resin composition and photosolder resist ink containing the composition | GOO CHEMICAL CO., LTD. (JP) | 2004-03-04 | — | — | US | disclosed |
| US-20040006161-A1 | Ultraviolet curable resin composition and photo solder resist ink including the same | GOO CHEMICAL CO., LTD. (JP) | 2004-01-08 | — | — | US | disclosed |
| EP-1324135-A1 | ULTRAVIOLET-CURABLE RESIN COMPOSITION AND PHOTOSOLDER RESIST INK CONTAINING THE COMPOSITION | Goo Chemical Co., Ltd. (JP) | 2003-07-02 | — | — | EP | disclosed |
| US-6465540-B1 | POLYMER CONTAINING EPOXIZED ETHYLENICALLY UNSATURATE, DIACRY-LATED POLYETHER AND POLYBASIC ANHYDRIDE WITH SUCH AS A CRESOL NOVOLAC EPOXY RESIN AND PHOTOINITIATOR; DILUTE ALKALI DEVE-LOPABLE; PROTECTIVE FILMS FOR COLOR FILTERS; PRINTED CIRCUITS | GOO CHEMICAL CO., LTD. (JP) | 2002-10-15 | — | — | US | disclosed |
| US-6432612-B1 | ADDITION-CONDENSATION COPOLYMER | GOO CHEMICAL CO., LTD. (JP) | 2002-08-13 | — | — | US | disclosed |
| US-6136506-A | EPOXY RESIN OBTAINED BY EXTENDING CHAINS OF EPOXY COMPOUND BY AN ISOCYANATE COMPOUND HAVING TWO ISOCYANATE GROUPS PER MOLECULE, AN ULTRAVIOLET-CURABLE RESIN HAVING CARBOXYL GROUP AND AN ETHYLENICALLY UNSATURATED GROUP, INITIATOR | GOO CHEMICAL CO., LTD. | 2000-10-24 | — | — | US | disclosed |
| EP-1037111-A1 | Ultraviolet curable resin composition and photo solder resist ink using the same | Goo Chemical Co., Ltd. (JP) | 2000-09-20 | — | — | EP | disclosed |
| US-5821031-A | AN ULTRAVIOLET CURABLE RESIN CONTAINING AN ETHYLENICALLY UNSATURATED MONOMER HAVING AN EPOXY GROUP, (METH)ACRYLIC ACID, A SATURATED OR UNSATURATED POLYBASIC ANHYDRIDE AND AN EPOXY COMPOUND | GOO CHEMICAL CO., LTD. (JP) | 1998-10-13 | — | — | US | disclosed |
| EP-0864926-A1 | PHOTOSENSITIVE RESIN COMPOSITION, AND COATING FILM, RESIST INK, RESIST, SOLDER RESIST AND PRINTED CIRCUIT BOARD EACH PRODUCED THEREFROM | Goo Chemical Industries Co.,Ltd. (JP) | 1998-09-16 | — | — | EP | disclosed |
| EP-0733683-A1 | PHOTOSOLDER RESIST INK, PRINTED CIRCUIT BOARD, AND PROCESS FOR PRODUCING THE SAME | Goo Chemical Co., Ltd. (JP) | 1996-09-25 | — | — | EP | disclosed |
| US-5039343-A | Water borne metallic coating composition | NIPPON PAINT CO., LTD. (JP) | 1991-08-13 | — | — | US | disclosed |
| EP-0393579-A1 | Water borne metallic coating composition | NIPPON PAINT CO., LTD. (JP) | 1990-10-24 | — | — | EP | disclosed |