⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15105519 | 0.80 | — | — | |
| SCHEMBL1469867 | 0.78 | — | — | |
| SCHEMBL28867977 | 0.72 | — | — | |
| SCHEMBL453884 | 0.72 | — | — | |
| SCHEMBL7120876 | 0.72 | — | — | |
| SCHEMBL17629734 | 0.69 | — | — | |
| SCHEMBL4241385 | 0.69 | — | — | |
| SCHEMBL5611269 | 0.69 | — | — | |
| SCHEMBL146826 | 0.69 | — | — | |
| SCHEMBL9154631 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11537045-B2 | Photosensitive compositions and applications thereof | PROMERUS, LLC (US) | 2022-12-27 | — | — | US | claimed |
| CN-109313388-B | Negative photosensitive composition | 住友电木株式会社 | 2022-06-21 | — | — | CN | claimed |
| CN-114555674-A | Photosensitive composition and application thereof | 普罗米鲁斯有限责任公司 | 2022-05-27 | — | — | CN | claimed |
| US-20210116807-A1 | PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF | PROMERUS, LLC (US) | 2021-04-22 | — | — | US | claimed |
| US-10915019-B2 | Photosensitive compositions, color filter and microlens derived therefrom | PROMERUS, LLC (US) | 2021-02-09 | — | — | US | claimed |
| CN-107407872-B | Photoimageable polyolefin composition containing photobase generator | 住友电木株式会社 | 2020-08-07 | — | — | CN | claimed |
| US-10712661-B2 | Negative tone photosensitive compositions | PROMERUS, LLC (US) | 2020-07-14 | — | — | US | claimed |
| CN-106715399-B | Diazacyclopropene compounds as photocrosslinkers and photoimageable compositions containing the same | 住友电木株式会社 | 2020-05-19 | — | — | CN | claimed |
| EP-3197881-B1 | DIAZIRINE COMPOUNDS AS PHOTOCROSSLINKERS AND PHOTOIMAGEABLE COMPOSITIONS COMPRISING THEM | PROMERUS LLC (US) | 2020-04-29 | — | — | EP | claimed |
| US-10634998-B2 | Photoimageable polyolefin compositions containing photobase generators | PROMERUS, LLC (US) | 2020-04-28 | — | — | US | claimed |
| US-20160051945-A1 | PERVAPORATION MEMBRANES DERIVED FROM POLYCYCLO-OLEFINIC BLOCK COPOLYMERS | SUMITOMO BAKELITE CO., LTD. (JP) | 2016-02-25 | — | — | US | claimed |
| US-20160046752-A1 | POLYCYCLO-OLEFINIC BLOCK COPOLYMERS | SUMITOMO BAKELITE CO., LTD. (JP) | 2016-02-18 | — | — | US | claimed |
| WO-2016025942-A1 | POLYCYCLO-OLEFINIC BLOCK POLYMERS AND PERVAPORATION MEMBRANES MADE THEREFROM | PROMERUS, LLC (US) | 2016-02-18 | — | — | WO | claimed |
| US-20160046657-A1 | ORGANOPALLADIUM COMPOUNDS AS POLYMERIZATION CATALYSTS | SUMITOMO BAKELITE CO., LTD. (JP) | 2016-02-18 | — | — | US | claimed |
| US-8986923-B2 | Aqueous base-developable negative-tone films based on functionalized norbornene polymers | PROMERUS, LLC (US) | 2015-03-24 | — | — | US | claimed |
| US-20140322647-A1 | PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF | SUMITOMO BAKELITE CO., LTD (JP) | 2014-10-30 | — | — | US | claimed |
| US-20140038112-A1 | AQUEOUS BASE-DEVELOPABLE NEGATIVE-TONE FILMS BASED ON FUNCTIONALIZED NORBORNENE POLYMERS | PROMERUS, LLC (US) | 2014-02-06 | — | — | US | claimed |
| WO-2013109529-A1 | THERMO-OXIDATIVELY STABLE, SIDE CHAIN POLYETHER FUNCTIONALIZED POLYNORBORNENES FOR MICROELECTRONIC AND OPTOELECTRONIC DEVICES AND ASSEMBLIES THEREOF | PROMERUS LLC (US) | 2013-07-25 | — | — | WO | claimed |
| US-20130181199-A1 | Thermo-oxidatively Stable, Side Chain Polyether Functionalized Polynorbornenes for Microelectronic and Optoelectronic Devices and Assemblies Thereof | SUMITOMO BAKELITE CO., LTD. (JP) | 2013-07-18 | — | — | US | claimed |
| US-20060275697-A1 | Top coating composition for photoresist and method of forming photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-12-07 | — | — | US | claimed |