⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL168279 | 0.55 | — | — | |
| SCHEMBL809291 | 0.55 | — | — | |
| SCHEMBL3084255 | 0.50 | — | — | |
| SCHEMBL3784745 | 0.50 | — | — | |
| SCHEMBL11337194 | 0.50 | — | — | |
| SCHEMBL390702 | 0.50 | — | — | |
| SCHEMBL596902 | 0.50 | — | — | |
| SCHEMBL22807002 | 0.50 | — | — | |
| SCHEMBL6727427 | 0.50 | — | — | |
| SCHEMBL3859148 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117983212-A | CO-SCR catalyst and preparation method and application thereof | 中国环境科学研究院 | 2024-05-07 | — | — | CN | disclosed |
| EP-1922588-B1 | PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS | FUJIFILM CORP (JP) | 2015-01-07 | — | — | EP | disclosed |
| US-8383330-B2 | Pattern exposure method and pattern exposure apparatus | FUJIFILM CORPORATION (JP) | 2013-02-26 | — | — | US | disclosed |
| US-8043800-B2 | Photosensitive material for forming conductive film, and conductive material | FUJIFILM CORPORATION (JP) | 2011-10-25 | — | — | US | disclosed |
| US-20110070404-A1 | PHOTOSENSITIVE MATERIAL FOR FORMING CONDUCTIVE FILM, AND CONDUCTIVE MATERIAL | FUJIFILM CORPORATION (JP) | 2011-03-24 | — | — | US | disclosed |
| US-7829270-B2 | Photosensitive material, method of manufacturing conductive metal film, conductive metal film and light-transmitting film shielding electromagnetic wave for plasma display panel | FUJIFILM CORPORATION (JP) | 2010-11-09 | — | — | US | disclosed |
| US-20100078330-A1 | APPARATUS AND METHOD FOR MANUFACTURING PLATED FILM | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |
| US-20090268186-A1 | PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS | FUJIFILM CORPORATION (JP) | 2009-10-29 | — | — | US | disclosed |
| US-20090017277-A1 | comprising a support; and an emulsion layer containing a silver salt emulsion, the photosensitive material being capable of forming a conductive metal film by exposing and developing the emulsion layer, wherein the emulsion layer has a swelling rate of 150% or more | FUJIFILM CORPORATION (JP) | 2009-01-15 | — | — | US | disclosed |
| EP-1922588-A1 | PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS | FUJIFILM Corporation (JP) | 2008-05-21 | — | — | EP | disclosed |
| WO-2007029852-A1 | PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS | FUJIFILM CORPORATION (JP) | 2007-03-15 | — | — | WO | disclosed |
| WO-2006137555-A1 | APPARATUS AND METHOD FOR MANUFACTURING PLATED FILM | FUJIFILM CORPORATION (JP) | 2006-12-28 | — | — | WO | disclosed |
| WO-2006126739-A1 | PHOTOSENSITIVE MATERIAL, METHOD OF MANUFACTURING CONDUCTIVE METAL FILM, CONDUCTIVE METAL FILM AND LIGHT-TRANSMITTING FILM SHIELDING ELECTROMAGNETIC WAVE FOR PLASMA DISPLAY PANEL | FUJIFILM CORPORATION (JP) | 2006-11-30 | — | — | WO | disclosed |
| US-6521389-B2 | Used in graphic arts; contrast | FUJI PHOTO FILM CO., LTD. (JP) | 2003-02-18 | — | — | US | disclosed |
| US-6472132-B1 | Silver halide photographic light-sensitive material and processing method thereof | FUJI PHOTO FILM CO., LTD. (JP) | 2002-10-29 | — | — | US | disclosed |
| US-6468710-B1 | HYDRAZINE NUCLEATING AGENT, PERFLUOROALKYL SURFACTANT | FUJI PHOTO FILM CO., LTD. (JP) | 2002-10-22 | — | — | US | disclosed |
| US-6458522-B1 | QUATERNARY AMMONIUM OR PHOSPHORUS SALT; ULTRA-HIGH CONTRAST | FUJI PHOTO FILM CO., LTD. (JP) | 2002-10-01 | — | — | US | disclosed |
| US-20020132179-A1 | Silver halide photographic light-sensitive material and processing method thereof | FUJIFILM CORPORATION (JP) | 2002-09-19 | — | — | US | disclosed |
| US-6171753-B1 | SUPPORT HAVING THEREON SPECTRALLY SENSITIZED LIGHT SENSITIVE SILVER HALIDE EMULSION LAYER CONTAINING AT LEAST TWO KINDS OF SILVER HALIDE EMULSIONS DIFFERENT IN THE CONCENTRATION OF A NITROGEN HETEROCYCLE CAPABLE OF FORMING COMPLEX WITH SILVER | FUJI PHOTO FILM CO., LTD. (JP) | 2001-01-09 | — | — | US | disclosed |
| US-4612402-A | Oxidation of olefins using rhodium nitro complex | ALLIED CORPORATION (US) | 1986-09-16 | — | — | US | disclosed |