⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2613472 | 0.84 | — | — | |
| SCHEMBL1538676 | 0.79 | — | — | |
| SCHEMBL19504331 | 0.78 | TSHR (0.30) | — | |
| SCHEMBL19672919 | 0.72 | — | — | |
| SCHEMBL19833142 | 0.72 | — | — | |
| SCHEMBL11959522 | 0.72 | — | — | |
| SCHEMBL8666262 | 0.72 | — | — | |
| SCHEMBL11914091 | 0.72 | — | — | |
| SCHEMBL14204 | 0.70 | — | — | |
| SCHEMBL620238 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023242598-A1 | BIFUNCTIONAL MOLECULES FOR TARGETED PROTEIN DEGRADATION | AMPHISTA THERAPEUTICS LIMITED (GB) | 2023-12-21 | — | — | WO | disclosed |
| US-20230145113-A1 | ELECTROLYTIC SOLUTION, ELECTROCHEMICAL DEVICE, LITHIUM-ION SECONDARY BATTERY, MODULE AND COMPOUND | DAIKIN INDUSTRIES, LTD. (JP) | 2023-05-11 | — | — | US | disclosed |
| US-10651286-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2020-05-12 | — | — | US | disclosed |
| US-20190305109-A1 | HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2019-10-03 | — | — | US | disclosed |
| US-10325998-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-06-18 | — | — | US | disclosed |
| US-10269924-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-04-23 | — | — | US | disclosed |
| WO-2017182495-A1 | INDAZOLE DERIVATIVES THAT DOWN-REGULATE THE ESTROGEN RECEPTOR AND POSSESS ANTI-CANCER ACTIVITY | ASTRAZENECA AB (SE) | 2017-10-26 | — | — | WO | disclosed |
| US-20170305909-A1 | CHEMICAL COMPOUNDS | ASTRAZENECA UK LIMITED (GB) | 2017-10-26 | — | — | US | disclosed |
| US-20170194457-A1 | HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2017-07-06 | — | — | US | disclosed |
| US-20170194497-A1 | HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2017-07-06 | — | — | US | disclosed |
| US-8916054-B2 | High fidelity patterning employing a fluorohydrocarbon-containing polymer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-12-23 | — | — | US | disclosed |
| US-20140216549-A1 | LIGHT-CONDENSING FILM, SOLAR CELL MODULE, AND TRANSFER MOLD | DAIKIN INDUSTRIES, LTD. (JP) | 2014-08-07 | — | — | US | disclosed |
| US-8765613-B2 | High selectivity nitride etch process | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-07-01 | — | — | US | disclosed |
| US-20130105916-A1 | HIGH SELECTIVITY NITRIDE ETCH PROCESS | ZEON CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| WO-2013063182-A1 | HIGH SELECTIVITY NITRIDE ETCH PROCESS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-05-02 | — | — | WO | disclosed |
| WO-2013062985-A1 | HIGH FIDELITY PATTERNING EMPLOYING A FLUOROHYDROCARBON-CONTAINING POLYMER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-05-02 | — | — | WO | disclosed |
| US-20130105996-A1 | LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER | ZEON CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| US-20130108833-A1 | HIGH FIDELITY PATTERNING EMPLOYING A FLUOROHYDROCARBON-CONTAINING POLYMER | ZEON CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| US-RE44096-E1 | Fluorine-containing compound having hydrolyzable metal alkoxide moiety, curable fluorine-containing polymer prepared from the same compound, and curable fluorine-containing resin composition comprising the same polymer | DAIKIN INDUSTRIES, LTD. (JP) | 2013-03-19 | — | — | US | disclosed |
| US-20110068086-A1 | PLASMA ETCHING METHOD | ZEON CORPORATION (JP) | 2011-03-24 | — | — | US | disclosed |