SCHEMBL1470118

SCHEMBL1470118

FC1(F)CCCCC1(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12212851 0.95
SCHEMBL12212860 0.95
SCHEMBL6451274 0.95
SCHEMBL1470768 0.90
SCHEMBL12212854 0.82
SCHEMBL16892601 0.79
SCHEMBL12212861 0.79
SCHEMBL9418585 0.78
SCHEMBL726127 0.78
SCHEMBL9908389 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2697453-B1 NON-AQUEOUS ELECTROLYTIC SOLUTIONS AND ELECTROCHEMICAL CELLS COMPRISING THE SAME SHENZHEN CAPCHEM TECHNOLOGY CO LTD (CN) 2018-10-10 EP claimed
US-10056649-B2 Non-aqueous electrolytic solutions and electrochemical cells comprising the same SHENZHEN CAPCHEM TECHNOLOGY CO., LTD. (CN) 2018-08-21 US claimed
EP-2697453-A2 NON-AQUEOUS ELECTROLYTIC SOLUTIONS AND ELECTROCHEMICAL CELLS COMPRISING THE SAME BASF Corporation (US) 2014-02-19 EP claimed
US-20140038059-A1 NON-AQUEOUS ELECTROLYTIC SOLUTIONS AND ELECTROCHEMICAL CELLS COMPRISING THE SAME BASF CORPORATION (US) 2014-02-06 US claimed
WO-2012142060-A2 NON-AQUEOUS ELECTROLYTIC SOLUTIONS AND ELECTROCHEMICAL CELLS COMPRISING THE SAME NOVOLYTE TECHNOLOGIES INC. (US) 2012-10-18 WO claimed
US-20250343048-A1 ETCHING METHOD RESONAC CORPORATION (JP) 2025-11-06 US disclosed
EP-4481794-A1 ETCHING METHOD Resonac Corporation (JP) 2024-12-25 EP disclosed
CN-118679554-A Etching method 株式会社力森诺科 2024-09-20 CN disclosed
US-20240092708-A1 Non-Cryogenic, Ammonia-Free Reduction of Aryl Compounds UNIVERSITY OF PITTSBURGH - OF THE COMMONWEALTH SYSTEM OF HIGHER EDUCATION 2024-03-21 US disclosed
US-11866386-B2 Non-cryogenic, ammonia-free reduction of aryl compounds University of Pittsburgh—of the Commonwealth System of Higher Education (US) 2024-01-09 US disclosed
WO-2023157441-A1 ETCHING METHOD 株式会社レゾナック 2023-08-24 WO disclosed
CN-115763976-A Additive for electrolyte and electrolyte containing additive 蜂巢能源科技(上饶)有限公司 2023-03-07 CN disclosed
US-20110068086-A1 PLASMA ETCHING METHOD ZEON CORPORATION (JP) 2011-03-24 US disclosed
US-20100284939-A1 HAIR CARE COMPOSITIONS AND METHODS OF TREATING HAIR USING SAME LIVING PROOF, INC. (US) 2010-11-11 US disclosed
US-6551764-B2 Exposing a resist layer of a polymer material that has at least one saturated alicycle substitited with fluorine atoms to vacuum ultraviolet rays for patterning into a predetermined shape SONY CORPORATION (JP) 2003-04-22 US disclosed
US-20020068242-A1 Exposure method SONY CORPORATION (JP) 2002-06-06 US disclosed
EP-0122000-B1 METHOD OF DETECTING TEMPERATURE IN AN OBJECT CHILDREN'S HOSPITAL MEDICAL CENTER (US) 1990-07-18 EP disclosed
US-4558279-A Methods for detecting and imaging a temperature of an object by nuclear magnetic resonance UNIVERSITY OF CINCINNATI (US) 1985-12-10 US disclosed
EP-0122000-A2 Method of detecting temperature in an object CHILDREN'S HOSPITAL MEDICAL CENTER (US) 1984-10-17 EP disclosed
US-4212815-A REACTING A KETONE WITH AN N,N-DISUBSTITUTED AMINOSULFUR TRIFLUORIDE E. I. DU PONT DE NEMOURS AND COMPANY (US) 1980-07-15 US disclosed