⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21977576 | 0.78 | — | — | |
| SCHEMBL9472534 | 0.75 | — | — | |
| SCHEMBL8634393 | 0.75 | — | — | |
| SCHEMBL23746600 | 0.73 | — | — | |
| SCHEMBL8740281 | 0.73 | — | — | |
| SCHEMBL1470785 | 0.73 | — | — | |
| SCHEMBL20249080 | 0.71 | — | — | |
| SCHEMBL323519 | 0.70 | — | — | |
| SCHEMBL20595260 | 0.69 | — | — | |
| SCHEMBL12562253 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10651286-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2020-05-12 | — | — | US | disclosed |
| US-20190305109-A1 | HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2019-10-03 | — | — | US | disclosed |
| US-10325998-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-06-18 | — | — | US | disclosed |
| US-10269924-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-04-23 | — | — | US | disclosed |
| US-20170194497-A1 | HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2017-07-06 | — | — | US | disclosed |
| US-20170194457-A1 | HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2017-07-06 | — | — | US | disclosed |
| US-9633948-B2 | Low energy etch process for nitrogen-containing dielectric layer | GLOBALFOUNDRIES INC. (KY) | 2017-04-25 | — | — | US | disclosed |
| US-9627533-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2017-04-18 | — | — | US | disclosed |
| CN-103946954-B | Use the high-fidelity composition of the polymer comprising fluorohydrocarbon | 国际商业机器公司 | 2016-12-28 | — | — | CN | disclosed |
| CN-103890918-B | high selectivity nitride etch process | 国际商业机器公司 | 2016-08-31 | — | — | CN | disclosed |
| WO-2013063182-A1 | HIGH SELECTIVITY NITRIDE ETCH PROCESS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-05-02 | — | — | WO | disclosed |
| US-20130105996-A1 | LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER | ZEON CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| US-20130105916-A1 | HIGH SELECTIVITY NITRIDE ETCH PROCESS | ZEON CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| CN-101983417-B | Plasma etching method | ZEON CORP | 2013-04-24 | — | — | CN | disclosed |
| US-20110068086-A1 | PLASMA ETCHING METHOD | ZEON CORPORATION (JP) | 2011-03-24 | — | — | US | disclosed |
| CN-101983417-A | Plasma etching method | ZEON CORP | 2011-03-02 | — | — | CN | disclosed |
| US-5705716-A | COMPOUNDS FOR SOLVENTS AND BLOWING AGENTS | ALLIEDSIGNAL INC. (US) | 1998-01-06 | — | — | US | disclosed |
| US-5316690-A | Blowing agents or solvents | ALLIED SIGNAL INC. (US) | 1994-05-31 | — | — | US | disclosed |
| US-5158617-A | Method of cleaning using hydrochlorofluorocarbons having 3 to 5 carbon atoms | ALLIED-SIGNAL INC. | 1992-10-27 | — | — | US | disclosed |
| WO-1992016674-A2 | A METHOD OF CLEANING USING HYDROCHLOROFLUOROCARBONS HAVING 3 TO 5 CARBON ATOMS | ALLIED-SIGNAL INC. (US) | 1992-10-01 | — | — | WO | disclosed |