⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL708463 | 0.91 | — | — | |
| SCHEMBL26132841 | 0.91 | — | — | |
| SCHEMBL61023 | 0.76 | — | — | |
| SCHEMBL5763715 | 0.73 | — | — | |
| SCHEMBL7053959 | 0.73 | — | — | |
| SCHEMBL1470794 | 0.71 | — | — | |
| SCHEMBL7670859 | 0.71 | — | — | |
| SCHEMBL7471548 | 0.71 | — | — | |
| SCHEMBL1470805 | 0.71 | — | — | |
| SCHEMBL35211257 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115466601-B | Fluorine-containing electronic cooling liquid | 北京宇极科技发展有限公司 | 2023-03-24 | — | — | CN | claimed |
| CN-115466601-A | Fluorine-containing electronic cooling liquid | 北京宇极科技发展有限公司 | 2022-12-13 | — | — | CN | claimed |
| US-20250343048-A1 | ETCHING METHOD | RESONAC CORPORATION (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-4481794-A1 | ETCHING METHOD | Resonac Corporation (JP) | 2024-12-25 | — | — | EP | disclosed |
| CN-118679554-A | Etching method | 株式会社力森诺科 | 2024-09-20 | — | — | CN | disclosed |
| WO-2023157441-A1 | ETCHING METHOD | 株式会社レゾナック | 2023-08-24 | — | — | WO | disclosed |
| CN-115466601-B | Fluorine-containing electronic cooling liquid | 北京宇极科技发展有限公司 | 2023-03-24 | — | — | CN | disclosed |
| CN-115466601-A | Fluorine-containing electronic cooling liquid | 北京宇极科技发展有限公司 | 2022-12-13 | — | — | CN | disclosed |
| US-10651286-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2020-05-12 | — | — | US | disclosed |
| US-20190305109-A1 | HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2019-10-03 | — | — | US | disclosed |
| US-10325998-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-06-18 | — | — | US | disclosed |
| US-20130105996-A1 | LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER | ZEON CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| WO-2013063179-A1 | LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-05-02 | — | — | WO | disclosed |
| US-20120321964-A1 | NONAQUEOUS SOLVENT AND NONAQUEOUS ELECTROLYTIC SOLUTION FOR ELECTRICAL STORAGE DEVICE AND NONAQUEOUS ELECTRICAL STORAGE DEVICE, LITHIUM SECONDARY BATTERY AND ELECTRIC DOUBLE LAYER CAPACITOR USING THE SAME | PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) | 2012-12-20 | — | — | US | disclosed |
| US-20110068086-A1 | PLASMA ETCHING METHOD | ZEON CORPORATION (JP) | 2011-03-24 | — | — | US | disclosed |
| US-20100041700-A1 | Substituted 1-(Azolin-2-yl)-Amino-1,2-Heterocyclyl-Ethane Compounds For Combating Pests | BASF SE (DE) | 2010-02-18 | — | — | US | disclosed |
| US-6927010-B2 | Resist material and exposure method | SONY CORPORATION (JP) | 2005-08-09 | — | — | US | disclosed |
| US-20030180656-A1 | Resist material and exposure method | SONY CORPORATION (JP) | 2003-09-25 | — | — | US | disclosed |
| US-6156824-A | Lubricative polymer containing liquid and method of forming film of lubricative polymer | NIPPON ZEON CO., LTD. (JP) | 2000-12-05 | — | — | US | disclosed |
| EP-0889092-A1 | LUBRICATIVE POLYMER CONTAINING LIQUID AND METHOD OF FORMING FILM OF LUBRICATIVE POLYMER | NIPPON ZEON CO., LTD. (JP) | 1999-01-07 | — | — | EP | disclosed |