SCHEMBL14713334

SCHEMBL14713334

[3H]OPP

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL196442 0.68
SCHEMBL13944882 0.54
SCHEMBL9999828 0.54
SCHEMBL3183074 0.50
SCHEMBL800202 0.50
SCHEMBL12038913 0.47
SCHEMBL15927890 0.47
SCHEMBL6994259 0.47
SCHEMBL16922834 0.47
SCHEMBL800245 0.47

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130045917-A1 METHOD OF SELECTING POLYPEPTIDE SEQUENCE, AND METAL OXIDE OR SILICON-CONTAINING COMPOUND BINDING PEPTIDE AND USE THEREOF RIKEN (JP) 2013-02-21 US disclosed
US-8158981-B2 Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-04-17 US disclosed
US-20100102321-A1 RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COATING FILM, SILICA-BASED COATING FILM, APPARATUS AND MEMBER HAVING SILICA-BASED COATING FILM AND PHOTOSENSITIZING AGENT FOR INSULATING FILM HITACHI CHEMICAL COMPANY, LTD. (JP) 2010-04-29 US disclosed