SCHEMBL1472066

SCHEMBL1472066

C=C[Si](OC)(OCCCCCCCCC=CCCCCCCCC)OCCCCCCCCC=CCCCCCCCC

nearest known ligand 0.51

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
LPAR1 Q92633 1/20 0.42
LPAR2 Q9HBW0 1/20 0.42
LPAR3 Q9UBY5 1/20 0.42
ALDH1A1 P00352 1/20 0.41
CNR1 P21554 1/20 0.41
CNR2 P34972 1/20 0.41
TRPV1 Q8NER1 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1472062 1.00 LPAR1 (0.42) LPAR1LPAR2LPAR3ALDH1A1CNR1
SCHEMBL17267897 0.97 LPAR1 (0.42) LPAR1LPAR2LPAR3ALDH1A1CNR1
SCHEMBL120646 0.97 LPAR1 (0.42) LPAR1LPAR2LPAR3ALDH1A1CNR1
SCHEMBL126202 0.91 TSHR (0.37) LPAR1LPAR2LPAR3
SCHEMBL127582 0.91 TSHR (0.37) LPAR1LPAR2LPAR3
SCHEMBL127535 0.91 TSHR (0.37) LPAR1LPAR2LPAR3
SCHEMBL22654200 0.89 TSHR (0.33) ALDH1A1
SCHEMBL1472049 0.88 TSHR (0.37) LPAR1LPAR2LPAR3
SCHEMBL130681 0.88 TSHR (0.37) LPAR1LPAR2LPAR3
SCHEMBL128541 0.88 TSHR (0.37) LPAR1LPAR2LPAR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3257685-B1 LITHOGRAPHIC PRINTING ORIGINAL PLATE, METHOD FOR MANUFACTURING SAME, AND PRINTING METHOD USING SAME FUJIFILM CORP (JP) 2020-03-04 EP disclosed
US-10022998-B2 Planographic printing plate precursor, method of producing same, and printing method using same FUJIFILM CORPORATION (JP) 2018-07-17 US disclosed
EP-3257685-A1 LITHOGRAPHIC PRINTING ORIGINAL PLATE, METHOD FOR MANUFACTURING SAME, AND PRINTING METHOD USING SAME Fujifilm Corporation (JP) 2017-12-20 EP disclosed
US-20170320350-A1 PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PRODUCING SAME, AND PRINTING METHOD USING SAME FUJIFILM CORPORATION (JP) 2017-11-09 US disclosed
US-20150368384-A1 SILYL GROUP-CONTAINING POLYVINYL ALCOHOL-BASED RESIN AND USE THEREOF THE NIPPON SYNTHETIC CHEMICAL INDUSTRY CO., LTD. (JP) 2015-12-24 US disclosed
EP-2947103-A1 SILYL GROUP-CONTAINING POLY(VINYL ALCOHOL)-BASED RESIN AND USE THEREOF The Nippon Synthetic Chemical Industry Co., Ltd. (JP) 2015-11-25 EP disclosed
EP-1754727-B1 ETHYLENE/VINYL ALCOHOL COPOLYMER AND MOLDED OBJECT THEREOF NIPPON SYNTHETIC CHEM IND (JP) 2012-04-18 EP disclosed
EP-1801154-B1 ETHYLENE/VINYL ALCOHOL COPOLYMER COMPOSITION AND MULTILAYER STRUCTURE COMPRISING THE SAME NIPPON SYNTHETIC CHEM IND (JP) 2011-08-31 EP disclosed
US-7915341-B2 Ethylene-vinyl alcohol copolymer and molded article thereof THE NIPPON SYNTHETIC CHEMICAL INDUSTRY CO., LTD. (JP) 2011-03-29 US disclosed
US-7691485-B2 Ethylene-vinyl alcohol copolymer composition and multilayer structure using the same THE NIPPON SYNTHETIC CHEMICAL INDUSTRY CO., LTD. (JP) 2010-04-06 US disclosed
US-20070196679-A1 Ethylene-Vinyl Alcohol Copolymer Composition and Multilayer Structure Using the Same MITSUBISHI CHEMICAL CORPORATION (JP) 2007-08-23 US disclosed
US-20070178268-A1 Ethylene-vinyl alcohol copolymer and molded article thereof THE NIPPON SYNTHETIC CHEMICAL INDUSTRY CO., LTD (JP) 2007-08-02 US disclosed
EP-1801154-A1 ETHYLENE/VINYL ALCOHOL COPOLYMER COMPOSITION AND MULTILAYER STRUCTURE COMPRISING THE SAME The Nippon Synthetic Chemical Industry Co., Ltd. (JP) 2007-06-27 EP disclosed
EP-1754727-A1 ETHYLENE/VINYL ALCOHOL COPOLYMER AND MOLDED OBJECT THEREOF The Nippon Synthetic Chemical Industry Co., Ltd. (JP) 2007-02-21 EP disclosed