SCHEMBL1472957

SCHEMBL1472957

[CH2]SCSC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14311940 0.82
SCHEMBL6549992 0.71
SCHEMBL570237 0.71
Ammonia Solution, Strong SCHEMBL670520 0.67
SCHEMBL1470865 0.64
SCHEMBL4343300 0.64
SCHEMBL3157381 0.64
SCHEMBL6688541 0.62
SCHEMBL1471528 0.62
SCHEMBL8021151 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9921498-B2 Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 2018-03-20 US disclosed
US-20160377998-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS CANON KABUSHIKI KAISHA (JP) 2016-12-29 US disclosed
US-8575249-B2 High heat-resistant polygermane compound with sulfur-containing organic group NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2013-11-05 US disclosed
US-20130059951-A1 HIGH HEAT-RESISTANT POLYGERMANE COMPOUND WITH SULFUR-CONTAINING ORGANIC GROUP TOHOKU UNIVERSITY (JP) 2013-03-07 US disclosed
EP-2537852-A1 POLYGERMANE COMPOUND WITH SULPHUR-CONTAINING ORGANIC GROUP DISPLAYING HIGH HEAT RESISTANCE Nissan Chemical Industries, Ltd. (JP) 2012-12-26 EP disclosed
US-7915441-B2 Oligophosphazene compound FUSHIMI PHARMACEUTICAL CO., LTD. (JP) 2011-03-29 US disclosed
US-20100160599-A1 OLIGOPHOSPHAZENE COMPOUND FUSHIMI PHARMACEUTICAL CO., LTD. (JP) 2010-06-24 US disclosed
WO-2004083275-A1 THERMOSETTING MOULDABLE MATERIAL PROVIDED WITH IMPROVED PROCESSABILITY AMI AGROLINZ MELAMINE INTERNATIONAL GMBH (AT) 2004-09-30 WO disclosed
EP-0987567-B1 A sulfur-containing (thio)ether (co)polymer and a use thereof MITSUI CHEMICALS INC (JP) 2004-04-07 EP disclosed
US-6320020-B1 POLYMER OR COPOLYMER CONTAINING A SULFUR ATOM WHOSE PRINCIPAL BACKBONE COMPRISES ETHER AND/OR THIOETHER BONDS; OPTICAL DISK SUBSTRATE; A LIQUID-CRYSTAL PLASTIC SUBSTRATE; VARIOUS OPTICAL LENSES INCLUDING AN EYEGLASS; AND AN LED SEALING COAT. MITSUI CHEMICALS, INC. (JP) 2001-11-20 US disclosed
EP-0987567-A1 A sulfur-containing (thio)ether (co)polymer and a use thereof Mitsui Chemicals, Inc. (JP) 2000-03-22 EP disclosed