⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17252151 | 0.84 | — | — | |
| SCHEMBL18199034 | 0.84 | CYP4F2 (0.30) | — | |
| SCHEMBL18199036 | 0.84 | GAA (0.32) | — | |
| SCHEMBL18199019 | 0.84 | — | — | |
| SCHEMBL27286512 | 0.81 | — | — | |
| SCHEMBL17252152 | 0.81 | — | — | |
| SCHEMBL17247959 | 0.80 | CYP4F2 (0.32) | — | |
| SCHEMBL2741155 | 0.78 | CYP4F2 (0.33) | — | |
| SCHEMBL14769027 | 0.77 | — | — | |
| SCHEMBL17247953 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160320699-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-03 | — | — | US | disclosed |
| US-20130065183-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-14 | — | — | US | disclosed |