SCHEMBL1477558

SCHEMBL1477558

[CH2]CCC1CC2C=CC1C2

nearest known ligand 0.43

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 12/20 0.43
ALDH1A1 P00352 5/20 0.43
TSHR P16473 1/20 0.38
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
HTT P42858 1/20 0.35
TDP1 Q9NUW8 4/20 0.33
LMNA P02545 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2D6 P10635 1/20 0.31
CYP2C19 P33261 1/20 0.31
ATM Q13315 1/20 0.31
GAA P10253 1/20 0.31
EPHX2 P34913 1/20 0.30
PKM P14618 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Magnesium Chloride Anhydrous SCHEMBL28301311 0.92 KDM4E (0.39) KDM4EALDH1A1TSHRMEN1KMT2A
SCHEMBL1478459 0.87 KDM4E (0.41) KDM4EALDH1A1TSHRMEN1KMT2A
SCHEMBL1012047 0.85 KDM4E (0.48) KDM4EALDH1A1TSHRMEN1KMT2A
SCHEMBL20472174 0.84 KDM4E (0.39) KDM4EALDH1A1TSHRMEN1KMT2A
SCHEMBL1975023 0.81 KDM4E (0.46) KDM4EALDH1A1TSHRMEN1KMT2A
SCHEMBL4445579 0.79 KDM4E (0.44) KDM4EALDH1A1TSHRMEN1KMT2A
SCHEMBL30996063 0.79 KDM4E (0.44) KDM4EALDH1A1TSHRMEN1KMT2A
SCHEMBL12112124 0.77 KDM4E (0.43) KDM4EALDH1A1TSHRMEN1KMT2A
SCHEMBL17934495 0.77 KDM4E (0.43) KDM4EALDH1A1TSHRMEN1KMT2A
SCHEMBL13175345 0.77 KDM4E (0.43) KDM4EALDH1A1TSHRMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116745332-A Resin composition 日本瑞翁株式会社 2023-09-12 CN disclosed
CN-109912735-A The preparation method of olefin polymerization catalysis external electron donor, catalyst system and polyolefin 中国科学院化学研究所 2019-06-21 CN disclosed
US-7915467-B2 layer contains a cyclic olefin resin having an epoxy group and a photoacid generator; low stress properties and adhesion; prevent breakage of the semiconductor wafer in a process for grinding the backside to make them thinner SUMITOMO BAKELITE COMPANY, LTD. (JP) 2011-03-29 US disclosed
US-7808083-B2 Semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2010-10-05 US disclosed
US-20100120937-A1 SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2010-05-13 US disclosed
US-20080277805-A1 Semiconductor Device SUMITOMO BAKELITE CO., LTD. (JP) 2008-11-13 US disclosed
US-20080090176-A1 Semiconductor Wafer And Semiconductor Device SUMITOMO BAKELITE CO., LTD. (JP) 2008-04-17 US disclosed
EP-1804291-A1 SEMICONDUCTOR WAFER AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-07-04 EP disclosed
EP-1801872-A1 SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-06-27 EP disclosed
US-4045416-A PROTECTIVE COATINGS UNION CARBIDE CORPORATION (US) 1977-08-30 US disclosed
US-3963771-A PROTECTIVE COATINGS UNION CARBIDE CORPORATION (US) 1976-06-15 US disclosed