⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14789980 | 0.98 | — | — | |
| SCHEMBL15869217 | 0.80 | — | — | |
| SCHEMBL16404732 | 0.77 | — | — | |
| SCHEMBL15869215 | 0.77 | — | — | |
| SCHEMBL12918652 | 0.76 | TSHR (0.39) | — | |
| SCHEMBL16020295 | 0.76 | TSHR (0.32) | — | |
| SCHEMBL4495144 | 0.75 | — | — | |
| SCHEMBL12918654 | 0.73 | TSHR (0.40) | — | |
| SCHEMBL105037 | 0.72 | — | — | |
| SCHEMBL18407696 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8865390-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-21 | — | — | US | disclosed |
| US-20140273447-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20130071788-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-21 | — | — | US | disclosed |