SCHEMBL1485895

SCHEMBL1485895

CNC1=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18698630 0.89
SCHEMBL1485613 0.79 EPHX2 (0.36)
SCHEMBL1221574 0.74
SCHEMBL19171476 0.74
SCHEMBL1485896 0.70
SCHEMBL1485764 0.69
SCHEMBL1221572 0.69
Hydrochloric Acid SCHEMBL29236920 0.69 EPHX2 (0.32)
SCHEMBL1485890 0.67
SCHEMBL1485636 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11332834-B2 Catalyst and manufacturing method thereof SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION (KR) 2022-05-17 US disclosed
CN-109312026-A catalytic composition SCG化学有限公司 2019-02-05 CN disclosed
CN-109311923-A Olefin polymerization catalysis SCG化学有限公司 2019-02-05 CN disclosed
US-20170283965-A1 CATALYST AND MANUFACTURING METHOD THEREOF GLOBAL FRONTIER CENTER FOR MULTISCALE ENERGY SYSTEMS (KR) 2017-10-05 US disclosed
US-20170237001-A1 FABRICATION OF CORRELATED ELECTRON MATERIAL DEVICES COMPRISING NITROGEN ARM LIMITED (GB) 2017-08-17 US disclosed
US-20170213960-A1 FABRICATION AND OPERATION OF CORRELATED ELECTRON MATERIAL DEVICES CERFE LABS, INC. 2017-07-27 US disclosed
WO-2017107907-A1 CONDENSED RING Γ-AMINO ACID DERIVATIVE AND PREPARATION METHOD AND MEDICAL USE THEREOF 四川海思科制药有限公司 2017-06-29 WO disclosed
US-9627615-B1 Fabrication of correlated electron material devices ARM LTD. (GB) 2017-04-18 US disclosed
CN-105074514-A Polarizing plate SUMITOMO CHEMICAL CO 2015-11-18 CN disclosed
US-8895781-B2 Transition metal-catalyzed C—H amination using unactivated amines GEORGETOWN UNIVERSITY (US) 2014-11-25 US disclosed
US-20110076454-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING STARTING PLATE FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND RELIEF PRINTING PLATE AND PROCESS FOR MAKING SAME FUJIFILM CORPORATION (JP) 2011-03-31 US disclosed
EP-2301750-A1 Resin composition for laser engraving, relief printing starting plate for laser engraving and process for producing the same Fujifilm Corporation (JP) 2011-03-30 EP disclosed
WO-2010090345-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE AND METHOD FOR PRODUCING RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2010-08-12 WO disclosed
US-20080193380-A1 Radiolabeled selective androgen receptor modulators and their use in prostate cancer imaging and therapy DALTON JAMES T 2008-08-14 US disclosed
US-7344700-B2 Radiolabeled selective androgen receptor modulators and their use in prostate cancer imaging and therapy UNIVERSITY OF TENNESSEE RESEARCH CORPORATION (US) 2008-03-18 US disclosed
US-20070265290-A1 Heterocyclic selective androgen receptor modulators and methods of use thereof UNIVERSITY OF TENNESSEE RESEARCH FOUNDATION 2007-11-15 US disclosed
US-7214693-B2 Heterocyclic selective androgen receptor modulators and methods of use thereof UNIVERSITY OF TENNESSEE RESEARCH FOUNDATION (US) 2007-05-08 US disclosed
US-20070066568-A1 Treating renal disease, burns, wounds and spinal cord injury with selective androgen receptor modulators UNIVERSITY OF TENNESSEE RESEARCH FOUNDATION 2007-03-22 US disclosed
EP-0206621-B1 PROCESS FOR DISPROPORTIONATING SILANES MITSUI TOATSU CHEMICALS, Inc. (JP) 1989-11-15 EP disclosed
EP-0206621-A1 Process for disproportionating silanes MITSUI TOATSU CHEMICALS, Inc. (JP) 1986-12-30 EP disclosed