SCHEMBL148657

SCHEMBL148657

[CH2][CH]CCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL45152 0.77
SCHEMBL9209159 0.72 TSHR (0.60)
SCHEMBL21462878 0.72 TSHR (0.60)
SCHEMBL3819456 0.72 TSHR (0.60)
SCHEMBL9205711 0.72 TSHR (0.60)
SCHEMBL6860211 0.72 TSHR (0.60)
SCHEMBL9121821 0.72 TSHR (0.60)
SCHEMBL23908703 0.71
SCHEMBL15602679 0.70
SCHEMBL15602680 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 939 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4165108-B1 POLYALKANOLAMINES BASF SE (DE) 2024-03-13 EP claimed
US-20230235471-A1 Polyalkanolamines BASF SE (DE) 2023-07-27 US claimed
US-20230203695-A1 Alkaline Composition For Copper Electroplating Comprising A Defect Reduction Agent BASF SE (DE) 2023-06-29 US claimed
CN-115768817-A Polyalcanolamines 巴斯夫欧洲公司 2023-03-07 CN claimed
CN-109320502-B Neurotensin receptor ligands 3B制药有限公司 2022-06-07 CN claimed
CN-114514339-A Composition for copper bump electrodeposition comprising leveling agent 巴斯夫欧洲公司 2022-05-17 CN claimed
CN-114450438-A Composition for copper bump electrodeposition comprising leveling agent 巴斯夫欧洲公司 2022-05-06 CN claimed
CN-114059125-A Cobalt plating compositions comprising additives for void-free sub-micron structure filling 巴斯夫欧洲公司 2022-02-18 CN claimed
EP-3922662-A1 POLYALKANOLAMINE BASF SE (DE) 2021-12-15 EP claimed
CN-109477234-B Cobalt plating compositions comprising additives for void-free sub-micron structure filling 巴斯夫欧洲公司 2021-12-10 CN claimed
US-20100059158-A1 TIRE FOR VEHICLE WHEELS COMPRISING AN IMPROVED ELASTOMERIC COMPONENT PIRELLI TYRE S.P.A 2010-03-11 US claimed
EP-2144874-A1 5-LIPOXYGENASE-ACTIVATING PROTEIN (FLAP) INHIBITORS Amira Pharmaceuticals, Inc. (US) 2010-01-20 EP claimed
EP-2077951-A1 TIRE FOR VEHICLE WHEELS COMPRISING AN IMPROVED ELASTOMERIC COMPONENT Pirelli Tyre S.p.A. (IT) 2009-07-15 EP claimed
WO-2008141011-A1 5-LIPOXYGENASE-ACTIVATING PROTEIN (FLAP) INHIBITORS AMIRA PHARMACEUTICALS, INC. (US) 2008-11-20 WO claimed
WO-2008052572-A1 TIRE FOR VEHICLE WHEELS COMPRISING AN IMPROVED ELASTOMERIC COMPONENT PIRELLI TYRE S.P.A. (IT) 2008-05-08 WO claimed
US-20070225285-A1 5-LIPOXYGENASE-ACTIVATING PROTEIN (FLAP) INHIBITORS AMIRA PHARMACEUTICALS, INC. (US) 2007-09-27 US claimed
US-7138550-B2 Bridged carbocyclic compounds and methods of making and using same AIR PRODUCTS AND CHEMICALS, INC. (US) 2006-11-21 US claimed
US-20050037289-A1 monomers that can be homopolymerized or copolymerized with other reactive components to make resins within sub-200 nanometer (nm) photoresist compositions VERSUM MATERIALS US, LLC 2005-02-17 US claimed
EP-1505050-A1 Bridged carbocyclic compounds and methods of making and using same AIR PRODUCTS AND CHEMICALS, INC. (US) 2005-02-09 EP claimed
US-6469220-B2 MONOMERS FOR PHOTORESIST MATERIALS WITH HIGH TRANSPARENCY AND A GREAT AFFINITY FOR THE SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-10-22 US claimed