⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10293963 | 0.99 | — | — | |
| SCHEMBL10178822 | 0.91 | — | — | |
| SCHEMBL10179093 | 0.90 | HMGCR (0.31) | — | |
| SCHEMBL10293972 | 0.89 | — | — | |
| SCHEMBL2740789 | 0.88 | — | — | |
| SCHEMBL17563384 | 0.85 | — | — | |
| SCHEMBL9973285 | 0.85 | — | — | |
| SCHEMBL14867147 | 0.84 | — | — | |
| SCHEMBL14867134 | 0.84 | — | — | |
| SCHEMBL14925037 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20130095427-A1 | RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-18 | — | — | US | disclosed |